A low-temperature synthesis of electrochemical active Pt nanoparticles and thin films by atomic layer deposition on Si(111) and glassy carbon surfaces

Rui Liu, Lihao Han, Zhuangqun Huang, Ivonne M. Ferrer, Arno H.M. Smets, Miro Zeman, Bruce S. Brunschwig, Nathan S. Lewis

Research output: Contribution to journalArticle

4 Citations (Scopus)


Atomic layer deposition (ALD) was used to deposit nanoparticles and thin films of Pt onto etched p-type Si(111) wafers and glassy carbon discs. Using precursors of MeCpPtMe3 and ozone and a temperature window of 200-300 °C, the growth rate was 80-110 pm/cycle. X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), and scanning electron microscopy (SEM) were used to analyze the composition, structure, morphology, and thickness of the ALD-grown Pt nanoparticle films. The catalytic activity of the ALD-grown Pt for the hydrogen evolution reaction was shown to be equivalent to that of e-beam evaporated Pt on glassy carbon electrode.

Original languageEnglish
Pages (from-to)28-34
Number of pages7
JournalThin Solid Films
Publication statusPublished - Jul 1 2015



  • Atomic layer deposition
  • Hydrogen evolution
  • Nanoparticles
  • Platinum
  • Thin films
  • Water splitting

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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