A low-temperature synthesis of electrochemical active Pt nanoparticles and thin films by atomic layer deposition on Si(111) and glassy carbon surfaces

Rui Liu, Lihao Han, Zhuangqun Huang, Ivonne M. Ferrer, Arno H M Smets, Miro Zeman, Bruce S. Brunschwig, Nathan S Lewis

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

Atomic layer deposition (ALD) was used to deposit nanoparticles and thin films of Pt onto etched p-type Si(111) wafers and glassy carbon discs. Using precursors of MeCpPtMe3 and ozone and a temperature window of 200-300 °C, the growth rate was 80-110 pm/cycle. X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), and scanning electron microscopy (SEM) were used to analyze the composition, structure, morphology, and thickness of the ALD-grown Pt nanoparticle films. The catalytic activity of the ALD-grown Pt for the hydrogen evolution reaction was shown to be equivalent to that of e-beam evaporated Pt on glassy carbon electrode.

Original languageEnglish
Pages (from-to)28-34
Number of pages7
JournalThin Solid Films
Volume586
DOIs
Publication statusPublished - Jul 1 2015

Fingerprint

Atomic layer deposition
glassy carbon
Glassy carbon
atomic layer epitaxy
Nanoparticles
Thin films
nanoparticles
synthesis
thin films
Ozone
Temperature
ozone
catalytic activity
Hydrogen
Atomic force microscopy
Catalyst activity
Deposits
X ray photoelectron spectroscopy
deposits
photoelectron spectroscopy

Keywords

  • Atomic layer deposition
  • Hydrogen evolution
  • Nanoparticles
  • Platinum
  • Thin films
  • Water splitting

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Materials Chemistry
  • Metals and Alloys
  • Surfaces, Coatings and Films
  • Surfaces and Interfaces

Cite this

A low-temperature synthesis of electrochemical active Pt nanoparticles and thin films by atomic layer deposition on Si(111) and glassy carbon surfaces. / Liu, Rui; Han, Lihao; Huang, Zhuangqun; Ferrer, Ivonne M.; Smets, Arno H M; Zeman, Miro; Brunschwig, Bruce S.; Lewis, Nathan S.

In: Thin Solid Films, Vol. 586, 01.07.2015, p. 28-34.

Research output: Contribution to journalArticle

Liu, Rui ; Han, Lihao ; Huang, Zhuangqun ; Ferrer, Ivonne M. ; Smets, Arno H M ; Zeman, Miro ; Brunschwig, Bruce S. ; Lewis, Nathan S. / A low-temperature synthesis of electrochemical active Pt nanoparticles and thin films by atomic layer deposition on Si(111) and glassy carbon surfaces. In: Thin Solid Films. 2015 ; Vol. 586. pp. 28-34.
@article{2162fc2c2ccb4a94b11ba42cf33f1bef,
title = "A low-temperature synthesis of electrochemical active Pt nanoparticles and thin films by atomic layer deposition on Si(111) and glassy carbon surfaces",
abstract = "Atomic layer deposition (ALD) was used to deposit nanoparticles and thin films of Pt onto etched p-type Si(111) wafers and glassy carbon discs. Using precursors of MeCpPtMe3 and ozone and a temperature window of 200-300 °C, the growth rate was 80-110 pm/cycle. X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), and scanning electron microscopy (SEM) were used to analyze the composition, structure, morphology, and thickness of the ALD-grown Pt nanoparticle films. The catalytic activity of the ALD-grown Pt for the hydrogen evolution reaction was shown to be equivalent to that of e-beam evaporated Pt on glassy carbon electrode.",
keywords = "Atomic layer deposition, Hydrogen evolution, Nanoparticles, Platinum, Thin films, Water splitting",
author = "Rui Liu and Lihao Han and Zhuangqun Huang and Ferrer, {Ivonne M.} and Smets, {Arno H M} and Miro Zeman and Brunschwig, {Bruce S.} and Lewis, {Nathan S}",
year = "2015",
month = "7",
day = "1",
doi = "10.1016/j.tsf.2015.04.018",
language = "English",
volume = "586",
pages = "28--34",
journal = "Thin Solid Films",
issn = "0040-6090",
publisher = "Elsevier",

}

TY - JOUR

T1 - A low-temperature synthesis of electrochemical active Pt nanoparticles and thin films by atomic layer deposition on Si(111) and glassy carbon surfaces

AU - Liu, Rui

AU - Han, Lihao

AU - Huang, Zhuangqun

AU - Ferrer, Ivonne M.

AU - Smets, Arno H M

AU - Zeman, Miro

AU - Brunschwig, Bruce S.

AU - Lewis, Nathan S

PY - 2015/7/1

Y1 - 2015/7/1

N2 - Atomic layer deposition (ALD) was used to deposit nanoparticles and thin films of Pt onto etched p-type Si(111) wafers and glassy carbon discs. Using precursors of MeCpPtMe3 and ozone and a temperature window of 200-300 °C, the growth rate was 80-110 pm/cycle. X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), and scanning electron microscopy (SEM) were used to analyze the composition, structure, morphology, and thickness of the ALD-grown Pt nanoparticle films. The catalytic activity of the ALD-grown Pt for the hydrogen evolution reaction was shown to be equivalent to that of e-beam evaporated Pt on glassy carbon electrode.

AB - Atomic layer deposition (ALD) was used to deposit nanoparticles and thin films of Pt onto etched p-type Si(111) wafers and glassy carbon discs. Using precursors of MeCpPtMe3 and ozone and a temperature window of 200-300 °C, the growth rate was 80-110 pm/cycle. X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), and scanning electron microscopy (SEM) were used to analyze the composition, structure, morphology, and thickness of the ALD-grown Pt nanoparticle films. The catalytic activity of the ALD-grown Pt for the hydrogen evolution reaction was shown to be equivalent to that of e-beam evaporated Pt on glassy carbon electrode.

KW - Atomic layer deposition

KW - Hydrogen evolution

KW - Nanoparticles

KW - Platinum

KW - Thin films

KW - Water splitting

UR - http://www.scopus.com/inward/record.url?scp=84928988929&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84928988929&partnerID=8YFLogxK

U2 - 10.1016/j.tsf.2015.04.018

DO - 10.1016/j.tsf.2015.04.018

M3 - Article

VL - 586

SP - 28

EP - 34

JO - Thin Solid Films

JF - Thin Solid Films

SN - 0040-6090

ER -