A medium energy ion scattering and x-ray photoelectron spectroscopy study of physical vapor deposited thin cerium oxide films on Si(100)

R. Barnes, D. Starodub, T. Gustafsson, Eric Garfunkel

Research output: Contribution to journalArticle

33 Citations (Scopus)

Abstract

40 Å thick cerium oxide films have been grown on Si(100) substrates via physical vapor deposition of cerium metal in an oxygen background. The films have been characterized for their composition and thermal properties upon deposition and under different annealing conditions via x-ray photoelectron spectroscopy and medium energy ion scattering (MEIS) and their morphology using atomic force microscopy. By reoxidizing the films in 18O 2 gas and using MEIS, we investigated the processes responsible for film formation. We found that annealing the as-deposited samples to 750°C produced a cerium silicate film with a sharp silicate:silicon interface. Our results show that the oxygen transport in both the oxide and silicate films occurs via an exchange mechanism.

Original languageEnglish
Article number044103
JournalJournal of Applied Physics
Volume100
Issue number4
DOIs
Publication statusPublished - 2006

Fingerprint

cerium oxides
ion scattering
x ray spectroscopy
oxide films
photoelectron spectroscopy
vapors
silicates
cerium
energy
annealing
oxygen
thermodynamic properties
vapor deposition
atomic force microscopy
silicon
gases
metals

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)
  • Physics and Astronomy(all)

Cite this

A medium energy ion scattering and x-ray photoelectron spectroscopy study of physical vapor deposited thin cerium oxide films on Si(100). / Barnes, R.; Starodub, D.; Gustafsson, T.; Garfunkel, Eric.

In: Journal of Applied Physics, Vol. 100, No. 4, 044103, 2006.

Research output: Contribution to journalArticle

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