@inproceedings{2f17726c94ec4f2ab804e859f24ea546,
title = "A precise and scalable post-modification of mesoporous metal-organic framework NU-1000 via atomic layer deposition",
abstract = "The connectivity of NU-1000, a metal-organic framework, gives rise to Zr6 nodes with hydroxyl-containing functional groups pointing into the large 1D mesoporous hexagonal channels of the framework. These free and exposed-OH groups are ideal grafting sites, and they can be easily tailored to serve a specific function. Through atomic layer deposition in MOFs (AIM), we demonstrate the ability to form several oxides with atomic precision at the exposed-OH sites of NU-1000. Importantly, this process occurs without changing the overall structure of the framework. Recent progress in scaling AIM process of the ultrahigh surface area (2300 m2/g) framework as well as progress in pinpointing the location and mechanism of surface chemical reactions of catalytically relevant metals is discussed. Computational, synchrotron, and in-situ analytical methods including DFT, differential electron diffraction, and in situ FTIR are brought to bear on several new metal systems, many of which show remarkably self-limiting behavior.",
author = "Kim, {I. S.} and Farha, {O. K.} and Hupp, {J. T.} and L. Gagliardi and Chapman, {K. W.} and Cramer, {C. J.} and Martinson, {A. B.F.}",
note = "Funding Information: This work was supported as part of the Inorganometallic Catalysis Design Center, an Energy Frontier Research Center funded by the U.S. Department of Energy, Office of Science, Basic Energy Sciences under Award #DE-SC0012702. Work done at Argonne made use of the Advanced Photon Source, an Office of Science User Facility operated for the U.S. DOE/Office of Science by Argonne National Laboratory, was supported by the US DOE, Contract No. DE-AC02-06CH11357.; Symposium on Atomic Layer Deposition Applications 12 - PRiME 2016/230th ECS Meeting ; Conference date: 02-10-2016 Through 07-10-2016",
year = "2016",
doi = "10.1149/07506.0093ecst",
language = "English",
series = "ECS Transactions",
publisher = "Electrochemical Society Inc.",
number = "6",
pages = "93--99",
editor = "F. Roozeboom and Elam, {J. W.} and J. Dendooven and {van der Straten}, O. and {De Gendt}, S. and C. Liu and C. Huffman",
booktitle = "Atomic Layer Deposition Applications 12",
edition = "6",
}