Abstract
The connectivity of NU-1000, a metal-organic framework, gives rise to Zr6 nodes with hydroxyl-containing functional groups pointing into the large 1D mesoporous hexagonal channels of the framework. These free and exposed-OH groups are ideal grafting sites, and they can be easily tailored to serve a specific function. Through atomic layer deposition in MOFs (AIM), we demonstrate the ability to form several oxides with atomic precision at the exposed-OH sites of NU-1000. Importantly, this process occurs without changing the overall structure of the framework. Recent progress in scaling AIM process of the ultrahigh surface area (2300 m2/g) framework as well as progress in pinpointing the location and mechanism of surface chemical reactions of catalytically relevant metals is discussed. Computational, synchrotron, and in-situ analytical methods including DFT, differential electron diffraction, and in situ FTIR are brought to bear on several new metal systems, many of which show remarkably self-limiting behavior.
| Original language | English |
|---|---|
| Title of host publication | Atomic Layer Deposition Applications 12 |
| Publisher | Electrochemical Society Inc. |
| Pages | 93-99 |
| Number of pages | 7 |
| Volume | 75 |
| Edition | 6 |
| ISBN (Electronic) | 9781607685395 |
| DOIs | |
| Publication status | Published - 2016 |
| Event | Symposium on Atomic Layer Deposition Applications 12 - PRiME 2016/230th ECS Meeting - Honolulu, United States Duration: Oct 2 2016 → Oct 7 2016 |
Other
| Other | Symposium on Atomic Layer Deposition Applications 12 - PRiME 2016/230th ECS Meeting |
|---|---|
| Country | United States |
| City | Honolulu |
| Period | 10/2/16 → 10/7/16 |
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ASJC Scopus subject areas
- Engineering(all)
Cite this
A precise and scalable post-modification of mesoporous metal-organic framework NU-1000 via atomic layer deposition. / Kim, I. S.; Farha, O. K.; Hupp, Joseph T; Gagliardi, L.; Chapman, K. W.; Cramer, C. J.; Martinson, A. B F.
Atomic Layer Deposition Applications 12. Vol. 75 6. ed. Electrochemical Society Inc., 2016. p. 93-99.Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
}
TY - GEN
T1 - A precise and scalable post-modification of mesoporous metal-organic framework NU-1000 via atomic layer deposition
AU - Kim, I. S.
AU - Farha, O. K.
AU - Hupp, Joseph T
AU - Gagliardi, L.
AU - Chapman, K. W.
AU - Cramer, C. J.
AU - Martinson, A. B F
PY - 2016
Y1 - 2016
N2 - The connectivity of NU-1000, a metal-organic framework, gives rise to Zr6 nodes with hydroxyl-containing functional groups pointing into the large 1D mesoporous hexagonal channels of the framework. These free and exposed-OH groups are ideal grafting sites, and they can be easily tailored to serve a specific function. Through atomic layer deposition in MOFs (AIM), we demonstrate the ability to form several oxides with atomic precision at the exposed-OH sites of NU-1000. Importantly, this process occurs without changing the overall structure of the framework. Recent progress in scaling AIM process of the ultrahigh surface area (2300 m2/g) framework as well as progress in pinpointing the location and mechanism of surface chemical reactions of catalytically relevant metals is discussed. Computational, synchrotron, and in-situ analytical methods including DFT, differential electron diffraction, and in situ FTIR are brought to bear on several new metal systems, many of which show remarkably self-limiting behavior.
AB - The connectivity of NU-1000, a metal-organic framework, gives rise to Zr6 nodes with hydroxyl-containing functional groups pointing into the large 1D mesoporous hexagonal channels of the framework. These free and exposed-OH groups are ideal grafting sites, and they can be easily tailored to serve a specific function. Through atomic layer deposition in MOFs (AIM), we demonstrate the ability to form several oxides with atomic precision at the exposed-OH sites of NU-1000. Importantly, this process occurs without changing the overall structure of the framework. Recent progress in scaling AIM process of the ultrahigh surface area (2300 m2/g) framework as well as progress in pinpointing the location and mechanism of surface chemical reactions of catalytically relevant metals is discussed. Computational, synchrotron, and in-situ analytical methods including DFT, differential electron diffraction, and in situ FTIR are brought to bear on several new metal systems, many of which show remarkably self-limiting behavior.
UR - http://www.scopus.com/inward/record.url?scp=84991728488&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84991728488&partnerID=8YFLogxK
U2 - 10.1149/07506.0093ecst
DO - 10.1149/07506.0093ecst
M3 - Conference contribution
VL - 75
SP - 93
EP - 99
BT - Atomic Layer Deposition Applications 12
PB - Electrochemical Society Inc.
ER -