A precise and scalable post-modification of mesoporous metal-organic framework NU-1000 via atomic layer deposition

I. S. Kim, O. K. Farha, Joseph T Hupp, L. Gagliardi, K. W. Chapman, C. J. Cramer, A. B F Martinson

Research output: Chapter in Book/Report/Conference proceedingConference contribution

3 Citations (Scopus)

Abstract

The connectivity of NU-1000, a metal-organic framework, gives rise to Zr6 nodes with hydroxyl-containing functional groups pointing into the large 1D mesoporous hexagonal channels of the framework. These free and exposed-OH groups are ideal grafting sites, and they can be easily tailored to serve a specific function. Through atomic layer deposition in MOFs (AIM), we demonstrate the ability to form several oxides with atomic precision at the exposed-OH sites of NU-1000. Importantly, this process occurs without changing the overall structure of the framework. Recent progress in scaling AIM process of the ultrahigh surface area (2300 m2/g) framework as well as progress in pinpointing the location and mechanism of surface chemical reactions of catalytically relevant metals is discussed. Computational, synchrotron, and in-situ analytical methods including DFT, differential electron diffraction, and in situ FTIR are brought to bear on several new metal systems, many of which show remarkably self-limiting behavior.

Original languageEnglish
Title of host publicationAtomic Layer Deposition Applications 12
PublisherElectrochemical Society Inc.
Pages93-99
Number of pages7
Volume75
Edition6
ISBN (Electronic)9781607685395
DOIs
Publication statusPublished - 2016
EventSymposium on Atomic Layer Deposition Applications 12 - PRiME 2016/230th ECS Meeting - Honolulu, United States
Duration: Oct 2 2016Oct 7 2016

Other

OtherSymposium on Atomic Layer Deposition Applications 12 - PRiME 2016/230th ECS Meeting
CountryUnited States
CityHonolulu
Period10/2/1610/7/16

Fingerprint

Atomic layer deposition
Metals
Synchrotrons
Discrete Fourier transforms
Electron diffraction
Functional groups
Chemical reactions
Oxides

ASJC Scopus subject areas

  • Engineering(all)

Cite this

Kim, I. S., Farha, O. K., Hupp, J. T., Gagliardi, L., Chapman, K. W., Cramer, C. J., & Martinson, A. B. F. (2016). A precise and scalable post-modification of mesoporous metal-organic framework NU-1000 via atomic layer deposition. In Atomic Layer Deposition Applications 12 (6 ed., Vol. 75, pp. 93-99). Electrochemical Society Inc.. https://doi.org/10.1149/07506.0093ecst

A precise and scalable post-modification of mesoporous metal-organic framework NU-1000 via atomic layer deposition. / Kim, I. S.; Farha, O. K.; Hupp, Joseph T; Gagliardi, L.; Chapman, K. W.; Cramer, C. J.; Martinson, A. B F.

Atomic Layer Deposition Applications 12. Vol. 75 6. ed. Electrochemical Society Inc., 2016. p. 93-99.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Kim, IS, Farha, OK, Hupp, JT, Gagliardi, L, Chapman, KW, Cramer, CJ & Martinson, ABF 2016, A precise and scalable post-modification of mesoporous metal-organic framework NU-1000 via atomic layer deposition. in Atomic Layer Deposition Applications 12. 6 edn, vol. 75, Electrochemical Society Inc., pp. 93-99, Symposium on Atomic Layer Deposition Applications 12 - PRiME 2016/230th ECS Meeting, Honolulu, United States, 10/2/16. https://doi.org/10.1149/07506.0093ecst
Kim IS, Farha OK, Hupp JT, Gagliardi L, Chapman KW, Cramer CJ et al. A precise and scalable post-modification of mesoporous metal-organic framework NU-1000 via atomic layer deposition. In Atomic Layer Deposition Applications 12. 6 ed. Vol. 75. Electrochemical Society Inc. 2016. p. 93-99 https://doi.org/10.1149/07506.0093ecst
Kim, I. S. ; Farha, O. K. ; Hupp, Joseph T ; Gagliardi, L. ; Chapman, K. W. ; Cramer, C. J. ; Martinson, A. B F. / A precise and scalable post-modification of mesoporous metal-organic framework NU-1000 via atomic layer deposition. Atomic Layer Deposition Applications 12. Vol. 75 6. ed. Electrochemical Society Inc., 2016. pp. 93-99
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