A torsional strain mechanism to tune pitch in supramolecular helices

Liang Shi Li, Hongzhou Jiang, Benjamin W. Messmore, Steve R. Bull, Samuel I Stupp

Research output: Contribution to journalArticle

99 Citations (Scopus)

Abstract

(Figure Presented) On the turn: Torsional strain has been used to control the pitch of helical nanostructures in the range of tens to hundreds of nanometers. In this method, sterically induced torsional strain on the primary helices forces the secondary helices into superhelices, with the pitch tunable depending on the magnitude of the strain. UV radiation can be used to switch the pitch of specific helical nanostructures (see AFM images).

Original languageEnglish
Pages (from-to)5873-5876
Number of pages4
JournalAngewandte Chemie - International Edition
Volume46
Issue number31
DOIs
Publication statusPublished - 2007

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Nanostructures
Ultraviolet radiation
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Keywords

  • Helical structures
  • Nanostructures
  • Self-assembly
  • Superhelices
  • Torsional strain

ASJC Scopus subject areas

  • Chemistry(all)

Cite this

A torsional strain mechanism to tune pitch in supramolecular helices. / Li, Liang Shi; Jiang, Hongzhou; Messmore, Benjamin W.; Bull, Steve R.; Stupp, Samuel I.

In: Angewandte Chemie - International Edition, Vol. 46, No. 31, 2007, p. 5873-5876.

Research output: Contribution to journalArticle

Li, Liang Shi ; Jiang, Hongzhou ; Messmore, Benjamin W. ; Bull, Steve R. ; Stupp, Samuel I. / A torsional strain mechanism to tune pitch in supramolecular helices. In: Angewandte Chemie - International Edition. 2007 ; Vol. 46, No. 31. pp. 5873-5876.
@article{ce041bd3fe8240369aae3ccf8c264681,
title = "A torsional strain mechanism to tune pitch in supramolecular helices",
abstract = "(Figure Presented) On the turn: Torsional strain has been used to control the pitch of helical nanostructures in the range of tens to hundreds of nanometers. In this method, sterically induced torsional strain on the primary helices forces the secondary helices into superhelices, with the pitch tunable depending on the magnitude of the strain. UV radiation can be used to switch the pitch of specific helical nanostructures (see AFM images).",
keywords = "Helical structures, Nanostructures, Self-assembly, Superhelices, Torsional strain",
author = "Li, {Liang Shi} and Hongzhou Jiang and Messmore, {Benjamin W.} and Bull, {Steve R.} and Stupp, {Samuel I}",
year = "2007",
doi = "10.1002/anie.200701328",
language = "English",
volume = "46",
pages = "5873--5876",
journal = "Angewandte Chemie - International Edition",
issn = "1433-7851",
publisher = "John Wiley and Sons Ltd",
number = "31",

}

TY - JOUR

T1 - A torsional strain mechanism to tune pitch in supramolecular helices

AU - Li, Liang Shi

AU - Jiang, Hongzhou

AU - Messmore, Benjamin W.

AU - Bull, Steve R.

AU - Stupp, Samuel I

PY - 2007

Y1 - 2007

N2 - (Figure Presented) On the turn: Torsional strain has been used to control the pitch of helical nanostructures in the range of tens to hundreds of nanometers. In this method, sterically induced torsional strain on the primary helices forces the secondary helices into superhelices, with the pitch tunable depending on the magnitude of the strain. UV radiation can be used to switch the pitch of specific helical nanostructures (see AFM images).

AB - (Figure Presented) On the turn: Torsional strain has been used to control the pitch of helical nanostructures in the range of tens to hundreds of nanometers. In this method, sterically induced torsional strain on the primary helices forces the secondary helices into superhelices, with the pitch tunable depending on the magnitude of the strain. UV radiation can be used to switch the pitch of specific helical nanostructures (see AFM images).

KW - Helical structures

KW - Nanostructures

KW - Self-assembly

KW - Superhelices

KW - Torsional strain

UR - http://www.scopus.com/inward/record.url?scp=34547812680&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=34547812680&partnerID=8YFLogxK

U2 - 10.1002/anie.200701328

DO - 10.1002/anie.200701328

M3 - Article

C2 - 17607679

AN - SCOPUS:34547812680

VL - 46

SP - 5873

EP - 5876

JO - Angewandte Chemie - International Edition

JF - Angewandte Chemie - International Edition

SN - 1433-7851

IS - 31

ER -