ALD growth of Al₂O₃ on GaAs: Oxide reduction, interface structure and CV performance

We have studied the effect of the trimethylaluminum (TMA) precursor on the reduction of surface "native" oxides from GaAs substrates using medium energy ion scattering spectroscopy (MEIS), X-ray photoelectron spectroscopy (XPS) and electrical measurements. Our data show that after one single TMA pulse a substantial part of the native oxide is reduced and an oxygen-rich aluminum oxide layer is formed. Al2O3 films grown with the normal atomic layer deposition cycles of TMA and water show that the growth rate of the Al oxide during this initial reduction of the native oxides is faster than the rate once this reduction is completed. Furthermore, the results of C-V measurements of Al2O3/GaAs grown under the same conditions along with post deposition annealing indicate a good quality interface.