ALD synthesis of platinum nanoparticles on single-crystal SrTiO3 pretreated with wet chemical etching

Chuandao Wang, Pratik Koirala, Peter C Stair, Laurence Marks

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

Formic acid-hydrogen peroxide and buffered hydrogen fluoride-hydrogen peroxide solutions were used to etch single-crystal strontium titanate to remove carbon contamination and increase hydroxyl group density to improve atomic layer deposition onto these materials. X-ray photoelectron spectroscopy indicated that both are effective for carbon contamination removal. However, for increasing hydroxyl group density on the strontium titanate surface, the buffered hydrogen fluoride-hydrogen peroxide is more effective. Transmission electron microscopy and x-ray photoemission show enhanced platinum deposition on the etched strontium titanate surface. These results provide the basis for optimizing atomic layer deposition for other technologically relevant materials.

Original languageEnglish
Pages (from-to)661-665
Number of pages5
JournalApplied Surface Science
Volume422
DOIs
Publication statusPublished - Nov 15 2017

Keywords

  • Atomic layer deposition
  • Etch
  • Platinum
  • Surface condition

ASJC Scopus subject areas

  • Surfaces, Coatings and Films

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