Anomalous Expansion of CeO2 Nanocrystalline Membranes

Jaya P. Nair, Ellen Wachtel, Igor Lubomirsky, Juergen Fleig, Joachim Maier

Research output: Contribution to journalArticle

80 Citations (Scopus)

Abstract

The mechanical and chemical processes occurring in undoped nanocrystalline CeO2 membranes due to order-disorder transition of oxygen vacancies were analyzed. 1.5±0.2 μm thick CeO2 films were deposited by radio frequency (RF) magnetron plasma sputtering on silicon. The nanocrystalline membranes were studied using x-ray diffraction analysis (XRD) and scanning electron microscopy (SEM). It was found that the order-disorder transition led to a large lateral expansion and buckling of the membranes.

Original languageEnglish
Pages (from-to)2077-2081
Number of pages5
JournalAdvanced Materials
Volume15
Issue number24
DOIs
Publication statusPublished - Dec 17 2003

Fingerprint

Order disorder transitions
Membranes
Silicon
Oxygen vacancies
Thick films
Buckling
Sputtering
Diffraction
Plasmas
X rays
Scanning electron microscopy

ASJC Scopus subject areas

  • Materials Science(all)

Cite this

Anomalous Expansion of CeO2 Nanocrystalline Membranes. / Nair, Jaya P.; Wachtel, Ellen; Lubomirsky, Igor; Fleig, Juergen; Maier, Joachim.

In: Advanced Materials, Vol. 15, No. 24, 17.12.2003, p. 2077-2081.

Research output: Contribution to journalArticle

Nair, JP, Wachtel, E, Lubomirsky, I, Fleig, J & Maier, J 2003, 'Anomalous Expansion of CeO2 Nanocrystalline Membranes', Advanced Materials, vol. 15, no. 24, pp. 2077-2081. https://doi.org/10.1002/adma.200305549
Nair, Jaya P. ; Wachtel, Ellen ; Lubomirsky, Igor ; Fleig, Juergen ; Maier, Joachim. / Anomalous Expansion of CeO2 Nanocrystalline Membranes. In: Advanced Materials. 2003 ; Vol. 15, No. 24. pp. 2077-2081.
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