Anomalous surface diffusion in nanoscale direct deposition processes

P. Manandhar, J. Jang, G. C. Schatz, M. A. Ratner, S. Hong

Research output: Contribution to journalArticle

93 Citations (Scopus)

Abstract

The first systematic study of anomalous diffusion in nanoscale deposition processes is presented. Thus, the experimental and analysis tools in the manuscript can be utilized to study general diffusion processes for organic molecules on solid surfaces. From a practical point of view, this result demonstrates that after proper considerations, nanoscale direct deposition methods can be utilized to generate organic molecular patterns for very weak-binding cases.

Original languageEnglish
Article number115505
Pages (from-to)115505/1-115505/4
JournalPhysical review letters
Volume90
Issue number11
Publication statusPublished - Mar 21 2003

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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  • Cite this

    Manandhar, P., Jang, J., Schatz, G. C., Ratner, M. A., & Hong, S. (2003). Anomalous surface diffusion in nanoscale direct deposition processes. Physical review letters, 90(11), 115505/1-115505/4. [115505].