Anomalously weak adsorption of Cu on SiO2 and MgO surfaces

J. B. Zhou, H. C. Lu, T. Gustafsson, Eric Garfunkel

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Abstract

Using medium-energy ion-scattering (MEIS) as an in situ probe of coverage, we have investigated the adsorption of Cu on SiO2 and MgO(001) surfaces at 300 K. For the clean surfaces, only 35% (Cu/SiO2) and 50% (Cu/MgO) of the initially incident Cu atoms stick to the surfaces and are detected by MEIS. Our results are discussed in terms of a model in which desorption competes with migration and sticking of Cu adatoms onto defects and growing Cu nuclei.

Original languageEnglish
JournalSurface Science
Volume293
Issue number3
DOIs
Publication statusPublished - Aug 20 1993

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ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Condensed Matter Physics
  • Surfaces and Interfaces

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