Arrays of nanoscale lenses for subwavelength optical lithography

Jae Won Jang, Zijian Zheng, One Sun Lee, Wooyoung Shim, Gengfeng Zheng, George C Schatz, Chad A. Mirkin

Research output: Contribution to journalArticle

38 Citations (Scopus)

Abstract

Poly(ethylene glycol) (PEG) polymer lens arrays are made by using dip-pen nanolithography to deposit nanoscale PEG features on hydrophobically modified quartz glass. The dimensions of the PEG lenses are controlled by tuning dwell time and polymer molecular weight. The PEG polymer lenses on the quartz substrate act as a phase-shift photomask for fabricating subwavelength scale features, ∼100 nm in width. Depending upon UV irradiation time during the photolithography, the photoresist nanostructures can be transitioned from well-shaped (short time) to ring-shaped (long time) features. The technique can be used to pattern large areas through the use of cantilever arrays.

Original languageEnglish
Pages (from-to)4399-4404
Number of pages6
JournalNano Letters
Volume10
Issue number11
DOIs
Publication statusPublished - Nov 10 2010

Fingerprint

Photolithography
Polyethylene glycols
Lenses
lithography
lenses
Polymers
Quartz
polymers
quartz
pens
dwell
photomasks
Nanolithography
photolithography
Photomasks
photoresists
glycols
molecular weight
Photoresists
ethylene

Keywords

  • Dip-pen
  • finite element method
  • lens
  • lithography
  • nano
  • phase-shift
  • photomask
  • photoresist
  • poly(ethylene glycol)
  • simulation

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Mechanical Engineering

Cite this

Jang, J. W., Zheng, Z., Lee, O. S., Shim, W., Zheng, G., Schatz, G. C., & Mirkin, C. A. (2010). Arrays of nanoscale lenses for subwavelength optical lithography. Nano Letters, 10(11), 4399-4404. https://doi.org/10.1021/nl101942s

Arrays of nanoscale lenses for subwavelength optical lithography. / Jang, Jae Won; Zheng, Zijian; Lee, One Sun; Shim, Wooyoung; Zheng, Gengfeng; Schatz, George C; Mirkin, Chad A.

In: Nano Letters, Vol. 10, No. 11, 10.11.2010, p. 4399-4404.

Research output: Contribution to journalArticle

Jang, JW, Zheng, Z, Lee, OS, Shim, W, Zheng, G, Schatz, GC & Mirkin, CA 2010, 'Arrays of nanoscale lenses for subwavelength optical lithography', Nano Letters, vol. 10, no. 11, pp. 4399-4404. https://doi.org/10.1021/nl101942s
Jang JW, Zheng Z, Lee OS, Shim W, Zheng G, Schatz GC et al. Arrays of nanoscale lenses for subwavelength optical lithography. Nano Letters. 2010 Nov 10;10(11):4399-4404. https://doi.org/10.1021/nl101942s
Jang, Jae Won ; Zheng, Zijian ; Lee, One Sun ; Shim, Wooyoung ; Zheng, Gengfeng ; Schatz, George C ; Mirkin, Chad A. / Arrays of nanoscale lenses for subwavelength optical lithography. In: Nano Letters. 2010 ; Vol. 10, No. 11. pp. 4399-4404.
@article{2fefc022f09d44a69837ff86639a79a7,
title = "Arrays of nanoscale lenses for subwavelength optical lithography",
abstract = "Poly(ethylene glycol) (PEG) polymer lens arrays are made by using dip-pen nanolithography to deposit nanoscale PEG features on hydrophobically modified quartz glass. The dimensions of the PEG lenses are controlled by tuning dwell time and polymer molecular weight. The PEG polymer lenses on the quartz substrate act as a phase-shift photomask for fabricating subwavelength scale features, ∼100 nm in width. Depending upon UV irradiation time during the photolithography, the photoresist nanostructures can be transitioned from well-shaped (short time) to ring-shaped (long time) features. The technique can be used to pattern large areas through the use of cantilever arrays.",
keywords = "Dip-pen, finite element method, lens, lithography, nano, phase-shift, photomask, photoresist, poly(ethylene glycol), simulation",
author = "Jang, {Jae Won} and Zijian Zheng and Lee, {One Sun} and Wooyoung Shim and Gengfeng Zheng and Schatz, {George C} and Mirkin, {Chad A.}",
year = "2010",
month = "11",
day = "10",
doi = "10.1021/nl101942s",
language = "English",
volume = "10",
pages = "4399--4404",
journal = "Nano Letters",
issn = "1530-6984",
publisher = "American Chemical Society",
number = "11",

}

TY - JOUR

T1 - Arrays of nanoscale lenses for subwavelength optical lithography

AU - Jang, Jae Won

AU - Zheng, Zijian

AU - Lee, One Sun

AU - Shim, Wooyoung

AU - Zheng, Gengfeng

AU - Schatz, George C

AU - Mirkin, Chad A.

PY - 2010/11/10

Y1 - 2010/11/10

N2 - Poly(ethylene glycol) (PEG) polymer lens arrays are made by using dip-pen nanolithography to deposit nanoscale PEG features on hydrophobically modified quartz glass. The dimensions of the PEG lenses are controlled by tuning dwell time and polymer molecular weight. The PEG polymer lenses on the quartz substrate act as a phase-shift photomask for fabricating subwavelength scale features, ∼100 nm in width. Depending upon UV irradiation time during the photolithography, the photoresist nanostructures can be transitioned from well-shaped (short time) to ring-shaped (long time) features. The technique can be used to pattern large areas through the use of cantilever arrays.

AB - Poly(ethylene glycol) (PEG) polymer lens arrays are made by using dip-pen nanolithography to deposit nanoscale PEG features on hydrophobically modified quartz glass. The dimensions of the PEG lenses are controlled by tuning dwell time and polymer molecular weight. The PEG polymer lenses on the quartz substrate act as a phase-shift photomask for fabricating subwavelength scale features, ∼100 nm in width. Depending upon UV irradiation time during the photolithography, the photoresist nanostructures can be transitioned from well-shaped (short time) to ring-shaped (long time) features. The technique can be used to pattern large areas through the use of cantilever arrays.

KW - Dip-pen

KW - finite element method

KW - lens

KW - lithography

KW - nano

KW - phase-shift

KW - photomask

KW - photoresist

KW - poly(ethylene glycol)

KW - simulation

UR - http://www.scopus.com/inward/record.url?scp=78449295493&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=78449295493&partnerID=8YFLogxK

U2 - 10.1021/nl101942s

DO - 10.1021/nl101942s

M3 - Article

C2 - 20879780

AN - SCOPUS:78449295493

VL - 10

SP - 4399

EP - 4404

JO - Nano Letters

JF - Nano Letters

SN - 1530-6984

IS - 11

ER -