Arrays of nanoscale lenses for subwavelength optical lithography

Jae Won Jang, Zijian Zheng, One Sun Lee, Wooyoung Shim, Gengfeng Zheng, George C. Schatz, Chad A. Mirkin

Research output: Contribution to journalArticle

40 Citations (Scopus)

Abstract

Poly(ethylene glycol) (PEG) polymer lens arrays are made by using dip-pen nanolithography to deposit nanoscale PEG features on hydrophobically modified quartz glass. The dimensions of the PEG lenses are controlled by tuning dwell time and polymer molecular weight. The PEG polymer lenses on the quartz substrate act as a phase-shift photomask for fabricating subwavelength scale features, ∼100 nm in width. Depending upon UV irradiation time during the photolithography, the photoresist nanostructures can be transitioned from well-shaped (short time) to ring-shaped (long time) features. The technique can be used to pattern large areas through the use of cantilever arrays.

Original languageEnglish
Pages (from-to)4399-4404
Number of pages6
JournalNano letters
Volume10
Issue number11
DOIs
Publication statusPublished - Nov 10 2010

Keywords

  • Dip-pen
  • finite element method
  • lens
  • lithography
  • nano
  • phase-shift
  • photomask
  • photoresist
  • poly(ethylene glycol)
  • simulation

ASJC Scopus subject areas

  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanical Engineering

Fingerprint Dive into the research topics of 'Arrays of nanoscale lenses for subwavelength optical lithography'. Together they form a unique fingerprint.

  • Cite this

    Jang, J. W., Zheng, Z., Lee, O. S., Shim, W., Zheng, G., Schatz, G. C., & Mirkin, C. A. (2010). Arrays of nanoscale lenses for subwavelength optical lithography. Nano letters, 10(11), 4399-4404. https://doi.org/10.1021/nl101942s