Atomic layer deposition of Cu(i) oxide films using Cu(II) bis(dimethylamino-2-propoxide) and water

J. R. Avila, A. W. Peters, Zhanyong Li, M. A. Ortuño, A. B.F. Martinson, C. J. Cramer, Joseph T Hupp, O. K. Farha

Research output: Contribution to journalArticle

8 Citations (Scopus)

Abstract

To grow films of Cu2O, bis-(dimethylamino-2-propoxide)Cu(II), or Cu(dmap), is used as an atomic layer deposition precursor using only water vapor as a co-reactant. Between 110 and 175 °C, a growth rate of 0.12 ± 0.02 Å per cycle was measured using an in situ quartz crystal microbalance (QCM). X-ray photoelectron spectroscopy (XPS) confirms the growth of metal-oxide films featuring Cu(i).

Original languageEnglish
Pages (from-to)5790-5795
Number of pages6
JournalDalton Transactions
Volume46
Issue number18
DOIs
Publication statusPublished - 2017

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Atomic layer deposition
Quartz crystal microbalances
Steam
Oxide films
X ray photoelectron spectroscopy
Metals
Water

ASJC Scopus subject areas

  • Inorganic Chemistry

Cite this

Avila, J. R., Peters, A. W., Li, Z., Ortuño, M. A., Martinson, A. B. F., Cramer, C. J., ... Farha, O. K. (2017). Atomic layer deposition of Cu(i) oxide films using Cu(II) bis(dimethylamino-2-propoxide) and water. Dalton Transactions, 46(18), 5790-5795. https://doi.org/10.1039/c6dt02572b

Atomic layer deposition of Cu(i) oxide films using Cu(II) bis(dimethylamino-2-propoxide) and water. / Avila, J. R.; Peters, A. W.; Li, Zhanyong; Ortuño, M. A.; Martinson, A. B.F.; Cramer, C. J.; Hupp, Joseph T; Farha, O. K.

In: Dalton Transactions, Vol. 46, No. 18, 2017, p. 5790-5795.

Research output: Contribution to journalArticle

Avila, JR, Peters, AW, Li, Z, Ortuño, MA, Martinson, ABF, Cramer, CJ, Hupp, JT & Farha, OK 2017, 'Atomic layer deposition of Cu(i) oxide films using Cu(II) bis(dimethylamino-2-propoxide) and water', Dalton Transactions, vol. 46, no. 18, pp. 5790-5795. https://doi.org/10.1039/c6dt02572b
Avila, J. R. ; Peters, A. W. ; Li, Zhanyong ; Ortuño, M. A. ; Martinson, A. B.F. ; Cramer, C. J. ; Hupp, Joseph T ; Farha, O. K. / Atomic layer deposition of Cu(i) oxide films using Cu(II) bis(dimethylamino-2-propoxide) and water. In: Dalton Transactions. 2017 ; Vol. 46, No. 18. pp. 5790-5795.
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