Atomic layer deposition of Fe2O3 using ferrocene and ozone

Alex B.F. Martinson, Michael J. Devries, Joseph A. Libera, Steven T. Christensen, Joseph T. Hupp, Michael J. Pellin, Jeffrey W. Elam

Research output: Contribution to journalArticle

91 Citations (Scopus)

Abstract

Growing interest in Fe2O3 as a light harvesting layer in solar energy conversion devices stems from its unique combination of stability, nontoxicity, and exceptionally low material cost. Unfortunately, the known methods for conformally coating high aspect ratio structures with Fe 2O3 leave a glaring gap in the technologically relevant temperature range of 170-350 °C. Here, we elucidate a self-limiting atomic layer deposition (ALD) process for the growth of hematite, α-Fe 2O3, over a moderate temperature window using ferrocene and ozone. At 200 °C, the self-limiting growth of Fe2O 3 is observed at rates up to 1.4 Å/cycle. Dense and robust thin films grown on both fused quartz and silicon exhibit the expected optical bandgap (2.1 eV). In situ mass spectrometric analysis reveals the evolution of two distinct cyclic reaction products during the layer-by-layer growth. The readily available and relatively high vapor pressure iron precursor is utilized to uniformly coat a high surface area template with aspect ratio ∼150.

Original languageEnglish
Pages (from-to)4333-4339
Number of pages7
JournalJournal of Physical Chemistry C
Volume115
Issue number10
DOIs
Publication statusPublished - Mar 17 2011

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Energy(all)
  • Physical and Theoretical Chemistry
  • Surfaces, Coatings and Films

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    Martinson, A. B. F., Devries, M. J., Libera, J. A., Christensen, S. T., Hupp, J. T., Pellin, M. J., & Elam, J. W. (2011). Atomic layer deposition of Fe2O3 using ferrocene and ozone. Journal of Physical Chemistry C, 115(10), 4333-4339. https://doi.org/10.1021/jp110203x