Atomic layer deposition of Fe2O3 using ferrocene and ozone

Alex B F Martinson, Michael J. Devries, Joseph A. Libera, Steven T. Christensen, Joseph T Hupp, Michael J. Pellin, Jeffrey W. Elam

Research output: Contribution to journalArticle

81 Citations (Scopus)

Abstract

Growing interest in Fe2O3 as a light harvesting layer in solar energy conversion devices stems from its unique combination of stability, nontoxicity, and exceptionally low material cost. Unfortunately, the known methods for conformally coating high aspect ratio structures with Fe 2O3 leave a glaring gap in the technologically relevant temperature range of 170-350 °C. Here, we elucidate a self-limiting atomic layer deposition (ALD) process for the growth of hematite, α-Fe 2O3, over a moderate temperature window using ferrocene and ozone. At 200 °C, the self-limiting growth of Fe2O 3 is observed at rates up to 1.4 Å/cycle. Dense and robust thin films grown on both fused quartz and silicon exhibit the expected optical bandgap (2.1 eV). In situ mass spectrometric analysis reveals the evolution of two distinct cyclic reaction products during the layer-by-layer growth. The readily available and relatively high vapor pressure iron precursor is utilized to uniformly coat a high surface area template with aspect ratio ∼150.

Original languageEnglish
Pages (from-to)4333-4339
Number of pages7
JournalJournal of Physical Chemistry C
Volume115
Issue number10
DOIs
Publication statusPublished - Mar 17 2011

Fingerprint

Atomic layer deposition
Ozone
atomic layer epitaxy
ozone
Aspect ratio
solar energy conversion
Quartz
Hematite
Optical band gaps
Silicon
hematite
high aspect ratio
Vapor pressure
Reaction products
Energy conversion
stems
reaction products
Solar energy
vapor pressure
aspect ratio

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Electronic, Optical and Magnetic Materials
  • Surfaces, Coatings and Films
  • Energy(all)

Cite this

Martinson, A. B. F., Devries, M. J., Libera, J. A., Christensen, S. T., Hupp, J. T., Pellin, M. J., & Elam, J. W. (2011). Atomic layer deposition of Fe2O3 using ferrocene and ozone. Journal of Physical Chemistry C, 115(10), 4333-4339. https://doi.org/10.1021/jp110203x

Atomic layer deposition of Fe2O3 using ferrocene and ozone. / Martinson, Alex B F; Devries, Michael J.; Libera, Joseph A.; Christensen, Steven T.; Hupp, Joseph T; Pellin, Michael J.; Elam, Jeffrey W.

In: Journal of Physical Chemistry C, Vol. 115, No. 10, 17.03.2011, p. 4333-4339.

Research output: Contribution to journalArticle

Martinson, ABF, Devries, MJ, Libera, JA, Christensen, ST, Hupp, JT, Pellin, MJ & Elam, JW 2011, 'Atomic layer deposition of Fe2O3 using ferrocene and ozone', Journal of Physical Chemistry C, vol. 115, no. 10, pp. 4333-4339. https://doi.org/10.1021/jp110203x
Martinson ABF, Devries MJ, Libera JA, Christensen ST, Hupp JT, Pellin MJ et al. Atomic layer deposition of Fe2O3 using ferrocene and ozone. Journal of Physical Chemistry C. 2011 Mar 17;115(10):4333-4339. https://doi.org/10.1021/jp110203x
Martinson, Alex B F ; Devries, Michael J. ; Libera, Joseph A. ; Christensen, Steven T. ; Hupp, Joseph T ; Pellin, Michael J. ; Elam, Jeffrey W. / Atomic layer deposition of Fe2O3 using ferrocene and ozone. In: Journal of Physical Chemistry C. 2011 ; Vol. 115, No. 10. pp. 4333-4339.
@article{41bd695a00e84089b9b3230c423e89cf,
title = "Atomic layer deposition of Fe2O3 using ferrocene and ozone",
abstract = "Growing interest in Fe2O3 as a light harvesting layer in solar energy conversion devices stems from its unique combination of stability, nontoxicity, and exceptionally low material cost. Unfortunately, the known methods for conformally coating high aspect ratio structures with Fe 2O3 leave a glaring gap in the technologically relevant temperature range of 170-350 °C. Here, we elucidate a self-limiting atomic layer deposition (ALD) process for the growth of hematite, α-Fe 2O3, over a moderate temperature window using ferrocene and ozone. At 200 °C, the self-limiting growth of Fe2O 3 is observed at rates up to 1.4 {\AA}/cycle. Dense and robust thin films grown on both fused quartz and silicon exhibit the expected optical bandgap (2.1 eV). In situ mass spectrometric analysis reveals the evolution of two distinct cyclic reaction products during the layer-by-layer growth. The readily available and relatively high vapor pressure iron precursor is utilized to uniformly coat a high surface area template with aspect ratio ∼150.",
author = "Martinson, {Alex B F} and Devries, {Michael J.} and Libera, {Joseph A.} and Christensen, {Steven T.} and Hupp, {Joseph T} and Pellin, {Michael J.} and Elam, {Jeffrey W.}",
year = "2011",
month = "3",
day = "17",
doi = "10.1021/jp110203x",
language = "English",
volume = "115",
pages = "4333--4339",
journal = "Journal of Physical Chemistry C",
issn = "1932-7447",
publisher = "American Chemical Society",
number = "10",

}

TY - JOUR

T1 - Atomic layer deposition of Fe2O3 using ferrocene and ozone

AU - Martinson, Alex B F

AU - Devries, Michael J.

AU - Libera, Joseph A.

AU - Christensen, Steven T.

AU - Hupp, Joseph T

AU - Pellin, Michael J.

AU - Elam, Jeffrey W.

PY - 2011/3/17

Y1 - 2011/3/17

N2 - Growing interest in Fe2O3 as a light harvesting layer in solar energy conversion devices stems from its unique combination of stability, nontoxicity, and exceptionally low material cost. Unfortunately, the known methods for conformally coating high aspect ratio structures with Fe 2O3 leave a glaring gap in the technologically relevant temperature range of 170-350 °C. Here, we elucidate a self-limiting atomic layer deposition (ALD) process for the growth of hematite, α-Fe 2O3, over a moderate temperature window using ferrocene and ozone. At 200 °C, the self-limiting growth of Fe2O 3 is observed at rates up to 1.4 Å/cycle. Dense and robust thin films grown on both fused quartz and silicon exhibit the expected optical bandgap (2.1 eV). In situ mass spectrometric analysis reveals the evolution of two distinct cyclic reaction products during the layer-by-layer growth. The readily available and relatively high vapor pressure iron precursor is utilized to uniformly coat a high surface area template with aspect ratio ∼150.

AB - Growing interest in Fe2O3 as a light harvesting layer in solar energy conversion devices stems from its unique combination of stability, nontoxicity, and exceptionally low material cost. Unfortunately, the known methods for conformally coating high aspect ratio structures with Fe 2O3 leave a glaring gap in the technologically relevant temperature range of 170-350 °C. Here, we elucidate a self-limiting atomic layer deposition (ALD) process for the growth of hematite, α-Fe 2O3, over a moderate temperature window using ferrocene and ozone. At 200 °C, the self-limiting growth of Fe2O 3 is observed at rates up to 1.4 Å/cycle. Dense and robust thin films grown on both fused quartz and silicon exhibit the expected optical bandgap (2.1 eV). In situ mass spectrometric analysis reveals the evolution of two distinct cyclic reaction products during the layer-by-layer growth. The readily available and relatively high vapor pressure iron precursor is utilized to uniformly coat a high surface area template with aspect ratio ∼150.

UR - http://www.scopus.com/inward/record.url?scp=79953227425&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=79953227425&partnerID=8YFLogxK

U2 - 10.1021/jp110203x

DO - 10.1021/jp110203x

M3 - Article

VL - 115

SP - 4333

EP - 4339

JO - Journal of Physical Chemistry C

JF - Journal of Physical Chemistry C

SN - 1932-7447

IS - 10

ER -