Atomic layer deposition of Pt@CsH2PO4 for the cathodes of solid acid fuel cells

Dae Kwang Lim, Jian Liu, Shobhit A. Pandey, Haemin Paik, Calum R.I. Chisholm, Joseph T. Hupp, Sossina M. Haile

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

Atomic layer deposition (ALD) has been used to apply continuous Pt films on powders of the solid acid CsH2PO4 (CDP), in turn, used in the preparation of cathodes in solid acid fuel cells (SAFCs). The film deposition was carried out at 150 °C using trimethyl(methylcyclopentadienyl)platinum (MeCpPtMe3) as the Pt source and ozone as the reactant for ligand removal. Chemical analysis showed a Pt growth rate of 0.09 ± 0.01 wt%/cycle subsequent to an initial nucleation delay of 84 ± 20 cycles. Electron microscopy revealed the contiguous nature of the films prepared using 200 or more cycles. The cathode overpotential (0.48 ± 0.02 V at a current density of 200 mA/cm2) was independent of Pt deposition amount beyond the minimum required to achieve these continuous films. The cell electrochemical characteristics were moreover extremely stable with time, with the cathode overpotentials increasing by no more than 10 mV over a 100 h period of measurement. Thus, ALD holds promise as an effective tool in the preparation of SAFC cathodes with high activity and excellent stability.

Original languageEnglish
Pages (from-to)12-19
Number of pages8
JournalElectrochimica Acta
Volume288
DOIs
Publication statusPublished - Oct 20 2018

Keywords

  • Atomic layer deposition
  • CsHPO
  • Platinum film
  • Solid acid fuel cell

ASJC Scopus subject areas

  • Chemical Engineering(all)
  • Electrochemistry

Fingerprint Dive into the research topics of 'Atomic layer deposition of Pt@CsH<sub>2</sub>PO<sub>4</sub> for the cathodes of solid acid fuel cells'. Together they form a unique fingerprint.

  • Cite this