Atomic-scale engineering of the SiC-SiO2 interface

S. T. Pantelides; G. Duscher; M. Di Ventra; R. Buczko; K. McDonald; M. B. Huang; R. A. Weller; I. Baumvol; F. C. Stedile; C. Radtke; S. J. Pennycook; G. Chung; C. C. Tin; J. R. Williams; J. H. Won; L. C. Feldman

Atomic-scale engineering of the SiC-SiO₂ interface

S. T. Pantelides, G. Duscher, M. Di Ventra, R. Buczko, K. McDonald, M. B. Huang, R. A. Weller, I. Baumvol, F. C. Stedile, C. Radtke, S. J. Pennycook, G. Chung, C. C. Tin, J. R. Williams, J. H. Won, L. C. Feldman

Rutgers University

Research output: Contribution to journal › Conference article

1 Citation (Scopus)

Abstract

We report results from three distinct but related thrusts that aim to elucidate the atomic-scale structure and properties of the SiC-SiO₂ interface. a) First-principles theoretical calculations probe the global bonding arrangements and the local processes during oxidation; b) Z-contrast atomic-resolution transmission electron microscopy and electron-energy-loss spectroscopy provide images and interface spectra, and c) nuclear techniques and electrical measurements are used to profile N at the interface and determine interface trap densities.

Original language	English
Pages (from-to)	II/-
Journal	Materials Science Forum
Volume	338
Publication status	Published - Jan 1 2000
Event	ICSCRM '99: The International Conference on Silicon Carbide and Related Materials - Research Triangle Park, NC, USA Duration: Oct 10 1999 → Oct 15 1999

ASJC Scopus subject areas

Materials Science(all)
Condensed Matter Physics
Mechanics of Materials
Mechanical Engineering

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Pantelides, S. T., Duscher, G., Di Ventra, M., Buczko, R., McDonald, K., Huang, M. B., Weller, R. A., Baumvol, I., Stedile, F. C., Radtke, C., Pennycook, S. J., Chung, G., Tin, C. C., Williams, J. R., Won, J. H., & Feldman, L. C. (2000). Atomic-scale engineering of the SiC-SiO₂ interface. Materials Science Forum, 338, II/-.

Atomic-scale engineering of the SiC-SiO₂ interface. / Pantelides, S. T.; Duscher, G.; Di Ventra, M.; Buczko, R.; McDonald, K.; Huang, M. B.; Weller, R. A.; Baumvol, I.; Stedile, F. C.; Radtke, C.; Pennycook, S. J.; Chung, G.; Tin, C. C.; Williams, J. R.; Won, J. H.; Feldman, L. C.

In: Materials Science Forum, Vol. 338, 01.01.2000, p. II/-.

Research output: Contribution to journal › Conference article

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abstract = "We report results from three distinct but related thrusts that aim to elucidate the atomic-scale structure and properties of the SiC-SiO2 interface. a) First-principles theoretical calculations probe the global bonding arrangements and the local processes during oxidation; b) Z-contrast atomic-resolution transmission electron microscopy and electron-energy-loss spectroscopy provide images and interface spectra, and c) nuclear techniques and electrical measurements are used to profile N at the interface and determine interface trap densities.",

author = "Pantelides, {S. T.} and G. Duscher and {Di Ventra}, M. and R. Buczko and K. McDonald and Huang, {M. B.} and Weller, {R. A.} and I. Baumvol and Stedile, {F. C.} and C. Radtke and Pennycook, {S. J.} and G. Chung and Tin, {C. C.} and Williams, {J. R.} and Won, {J. H.} and Feldman, {L. C.}",

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AU - Pantelides, S. T.

AU - Duscher, G.

AU - Di Ventra, M.

AU - Buczko, R.

AU - McDonald, K.

AU - Huang, M. B.

AU - Weller, R. A.

AU - Baumvol, I.

AU - Stedile, F. C.

AU - Radtke, C.

AU - Pennycook, S. J.

AU - Chung, G.

AU - Tin, C. C.

AU - Williams, J. R.

AU - Won, J. H.

AU - Feldman, L. C.

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