Atomically Precise Growth of Catalytically Active Cobalt Sulfide on Flat Surfaces and within a Metal-Organic Framework via Atomic Layer Deposition

Aaron W. Peters, Zhanyong Li, Omar K. Farha, Joseph T. Hupp

Research output: Contribution to journalArticle

104 Citations (Scopus)


Atomic layer deposition (ALD) has been employed as a new synthetic route to thin films of cobalt sulfide on silicon and fluorine-doped tin oxide platforms. The self-limiting nature of the stepwise synthesis is established through growth rate studies at different pulse times and temperatures. Additionally, characterization of the materials by X-ray diffraction and X-ray photoelectron spectroscopy indicates that the crystalline phase of these films has the composition Co9S8. The nodes of the metal-organic framework (MOF) NU-1000 were then selectively functionalized with cobalt sulfide via ALD in MOFs (AIM). Spectroscopic techniques confirm uniform deposition of cobalt sulfide throughout the crystallites, with no loss in crystallinity or porosity. The resulting material, CoS-AIM, is catalytically active for selective hydrogenation of m-nitrophenol to m-aminophenol, and outperforms the analogous oxide AIM material (CoO-AIM) as well as an amorphous CoSx reference material. These results reveal AIM to be an effective method of incorporating high surface area and catalytically active cobalt sulfide in metal-organic frameworks. (Figure Presented).

Original languageEnglish
Pages (from-to)8484-8490
Number of pages7
JournalACS nano
Issue number8
Publication statusPublished - Aug 25 2015



  • atomic layer deposition
  • metal-organic framework
  • nanoscale Cos films

ASJC Scopus subject areas

  • Materials Science(all)
  • Engineering(all)
  • Physics and Astronomy(all)

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