Band alignment issues in metal/dielectric stacks

A combined photoemission and inverse photoemission study of the HfO 2/Pt and HfO 2/Hf systems

S. Sayan, R. A. Bartynski, J. Robertson, J. S. Suehle, E. Vogel, N. V. Nguyen, J. Ehrstein, J. J. Kopanski, S. Suzer, M. Banaszak Holl, Eric Garfunkel

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We have studied the HfO 2/Hf and HfO 2/Pt systems by photoemission and inverse photoemission spectroscopies. It is found that the "effective workfunction" of metals in multilayer structures are different than their vacuum workfunctions and are modified by their interface dipoles at the metal/high-k interface. The effective workfunction of Hf is 4.4 eV whereas that of Pt is 5.3 eV, within the range of acceptable values for PMOS and NMOS respectively.

Original languageEnglish
Title of host publicationProceedings - Electrochemical Society
EditorsM.C. Ozturk, L.J. Chen, P.J. Timans, F. Roozeboom, E.P. Gusev
Pages255-263
Number of pages9
Volume1
Publication statusPublished - 2004
EventAdvanced Short-Time Thermal Processing for Si-Based CMOS Devices II - Proceedings of the International Symposium - San Antonio, TX, United States
Duration: May 10 2004May 12 2004

Other

OtherAdvanced Short-Time Thermal Processing for Si-Based CMOS Devices II - Proceedings of the International Symposium
CountryUnited States
CitySan Antonio, TX
Period5/10/045/12/04

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Photoemission
Photoelectron spectroscopy
Metals
Multilayers
Vacuum

ASJC Scopus subject areas

  • Engineering(all)

Cite this

Sayan, S., Bartynski, R. A., Robertson, J., Suehle, J. S., Vogel, E., Nguyen, N. V., ... Garfunkel, E. (2004). Band alignment issues in metal/dielectric stacks: A combined photoemission and inverse photoemission study of the HfO 2/Pt and HfO 2/Hf systems. In M. C. Ozturk, L. J. Chen, P. J. Timans, F. Roozeboom, & E. P. Gusev (Eds.), Proceedings - Electrochemical Society (Vol. 1, pp. 255-263)

Band alignment issues in metal/dielectric stacks : A combined photoemission and inverse photoemission study of the HfO 2/Pt and HfO 2/Hf systems. / Sayan, S.; Bartynski, R. A.; Robertson, J.; Suehle, J. S.; Vogel, E.; Nguyen, N. V.; Ehrstein, J.; Kopanski, J. J.; Suzer, S.; Holl, M. Banaszak; Garfunkel, Eric.

Proceedings - Electrochemical Society. ed. / M.C. Ozturk; L.J. Chen; P.J. Timans; F. Roozeboom; E.P. Gusev. Vol. 1 2004. p. 255-263.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Sayan, S, Bartynski, RA, Robertson, J, Suehle, JS, Vogel, E, Nguyen, NV, Ehrstein, J, Kopanski, JJ, Suzer, S, Holl, MB & Garfunkel, E 2004, Band alignment issues in metal/dielectric stacks: A combined photoemission and inverse photoemission study of the HfO 2/Pt and HfO 2/Hf systems. in MC Ozturk, LJ Chen, PJ Timans, F Roozeboom & EP Gusev (eds), Proceedings - Electrochemical Society. vol. 1, pp. 255-263, Advanced Short-Time Thermal Processing for Si-Based CMOS Devices II - Proceedings of the International Symposium, San Antonio, TX, United States, 5/10/04.
Sayan S, Bartynski RA, Robertson J, Suehle JS, Vogel E, Nguyen NV et al. Band alignment issues in metal/dielectric stacks: A combined photoemission and inverse photoemission study of the HfO 2/Pt and HfO 2/Hf systems. In Ozturk MC, Chen LJ, Timans PJ, Roozeboom F, Gusev EP, editors, Proceedings - Electrochemical Society. Vol. 1. 2004. p. 255-263
Sayan, S. ; Bartynski, R. A. ; Robertson, J. ; Suehle, J. S. ; Vogel, E. ; Nguyen, N. V. ; Ehrstein, J. ; Kopanski, J. J. ; Suzer, S. ; Holl, M. Banaszak ; Garfunkel, Eric. / Band alignment issues in metal/dielectric stacks : A combined photoemission and inverse photoemission study of the HfO 2/Pt and HfO 2/Hf systems. Proceedings - Electrochemical Society. editor / M.C. Ozturk ; L.J. Chen ; P.J. Timans ; F. Roozeboom ; E.P. Gusev. Vol. 1 2004. pp. 255-263
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