Band alignment issues in metal/dielectric stacks: A combined photoemission and inverse photoemission study of the HfO 2/Pt and HfO 2/Hf systems

S. Sayan, R. A. Bartynski, J. Robertson, J. S. Suehle, E. Vogel, N. V. Nguyen, J. Ehrstein, J. J. Kopanski, S. Suzer, M. Banaszak Holl, E. Garfunkel

Research output: Contribution to conferencePaper

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Engineering & Materials Science