Band offsets of ultrathin high- κ oxide films with Si

Eric Bersch, Sylvie Rangan, Robert Allen Bartynski, Eric Garfunkel, Elio Vescovo

Research output: Contribution to journalArticle

149 Citations (Scopus)

Abstract

Valence- and conduction-band edges of ultrathin oxides (SiO2, HfO2, Hf0.7 Si0.3 O2, ZrO2, and Al2 O3) grown on a silicon substrate have been measured using ultraviolet photoemission and inverse photoemission spectroscopies in the same UHV chamber. The combination of these two techniques has enabled the direct determination of the oxide energy gaps as well as the offsets of the oxide valence- and conduction-band edges from those of the silicon substrate. These results are supplemented with synchrotron x-ray photoemission spectroscopy measurements allowing further characterization of the oxide composition and the evaluation of the silicon substrate contribution to the spectra. The electron affinity has also been systematically measured on the same samples. We find reasonably good agreement with earlier experiments where assumptions regarding energy-gap values were needed to establish the conduction-band offsets. The systematics of our photoemission and inverse photoemission results on different ultrathin films provide a comprehensive comparison of these related systems.

Original languageEnglish
Article number085114
JournalPhysical Review B - Condensed Matter and Materials Physics
Volume78
Issue number8
DOIs
Publication statusPublished - Aug 12 2008

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Oxides
Oxide films
oxide films
Photoemission
Silicon
photoelectric emission
Conduction bands
Photoelectron spectroscopy
Valence bands
conduction bands
oxides
Energy gap
Substrates
silicon
Electron affinity
Ultrathin films
valence
Synchrotrons
electron affinity
spectroscopy

ASJC Scopus subject areas

  • Condensed Matter Physics

Cite this

Band offsets of ultrathin high- κ oxide films with Si. / Bersch, Eric; Rangan, Sylvie; Bartynski, Robert Allen; Garfunkel, Eric; Vescovo, Elio.

In: Physical Review B - Condensed Matter and Materials Physics, Vol. 78, No. 8, 085114, 12.08.2008.

Research output: Contribution to journalArticle

Bersch, Eric ; Rangan, Sylvie ; Bartynski, Robert Allen ; Garfunkel, Eric ; Vescovo, Elio. / Band offsets of ultrathin high- κ oxide films with Si. In: Physical Review B - Condensed Matter and Materials Physics. 2008 ; Vol. 78, No. 8.
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