Abstract
A conductive atomic force microscopy (cAFM) technique has been developed that is capable of quantitatively measuring the magnitude and phase of alternating current flow through the tip/sample junction with a five order of magnitude improvement in sensitivity. Bridge-enhanced nanoscale impedance microscopy (BE-NIM) uses a tunable resistor/capacitor bridge circuit to null the spurious contribution to the tip/sample current caused by fringe capacitance between the cAFM cantilever and the sample. As a proof of principle, BE-NIM is used to characterize an array of electron-beam lithographically patterned metal-oxide-semiconductor capacitors and compared directly to conventional nanoscale impedance microscopy. In addition, BE-NIM is applied to a multiwalled carbon nanotube/poly (m -phenylenevinylene-co-2,5-dioctyloxy-p- phenylenevinylene) nanocomposite material, on which the alternating current behavior of individual nanoscale conductive pathways is quantitatively probed.
| Original language | English |
|---|---|
| Article number | 233117 |
| Pages (from-to) | 1-3 |
| Number of pages | 3 |
| Journal | Applied Physics Letters |
| Volume | 87 |
| Issue number | 23 |
| DOIs | |
| Publication status | Published - 2005 |
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ASJC Scopus subject areas
- Physics and Astronomy (miscellaneous)
Cite this
Bridge-enhanced nanoscale impedance microscopy. / Pingree, L. S C; Hersam, Mark C.
In: Applied Physics Letters, Vol. 87, No. 23, 233117, 2005, p. 1-3.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Bridge-enhanced nanoscale impedance microscopy
AU - Pingree, L. S C
AU - Hersam, Mark C
PY - 2005
Y1 - 2005
N2 - A conductive atomic force microscopy (cAFM) technique has been developed that is capable of quantitatively measuring the magnitude and phase of alternating current flow through the tip/sample junction with a five order of magnitude improvement in sensitivity. Bridge-enhanced nanoscale impedance microscopy (BE-NIM) uses a tunable resistor/capacitor bridge circuit to null the spurious contribution to the tip/sample current caused by fringe capacitance between the cAFM cantilever and the sample. As a proof of principle, BE-NIM is used to characterize an array of electron-beam lithographically patterned metal-oxide-semiconductor capacitors and compared directly to conventional nanoscale impedance microscopy. In addition, BE-NIM is applied to a multiwalled carbon nanotube/poly (m -phenylenevinylene-co-2,5-dioctyloxy-p- phenylenevinylene) nanocomposite material, on which the alternating current behavior of individual nanoscale conductive pathways is quantitatively probed.
AB - A conductive atomic force microscopy (cAFM) technique has been developed that is capable of quantitatively measuring the magnitude and phase of alternating current flow through the tip/sample junction with a five order of magnitude improvement in sensitivity. Bridge-enhanced nanoscale impedance microscopy (BE-NIM) uses a tunable resistor/capacitor bridge circuit to null the spurious contribution to the tip/sample current caused by fringe capacitance between the cAFM cantilever and the sample. As a proof of principle, BE-NIM is used to characterize an array of electron-beam lithographically patterned metal-oxide-semiconductor capacitors and compared directly to conventional nanoscale impedance microscopy. In addition, BE-NIM is applied to a multiwalled carbon nanotube/poly (m -phenylenevinylene-co-2,5-dioctyloxy-p- phenylenevinylene) nanocomposite material, on which the alternating current behavior of individual nanoscale conductive pathways is quantitatively probed.
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U2 - 10.1063/1.2137874
DO - 10.1063/1.2137874
M3 - Article
VL - 87
SP - 1
EP - 3
JO - Applied Physics Letters
JF - Applied Physics Letters
SN - 0003-6951
IS - 23
M1 - 233117
ER -