Abstract
A conductive atomic force microscopy (cAFM) technique has been developed that is capable of quantitatively measuring the magnitude and phase of alternating current flow through the tip/sample junction with a five order of magnitude improvement in sensitivity. Bridge-enhanced nanoscale impedance microscopy (BE-NIM) uses a tunable resistor/capacitor bridge circuit to null the spurious contribution to the tip/sample current caused by fringe capacitance between the cAFM cantilever and the sample. As a proof of principle, BE-NIM is used to characterize an array of electron-beam lithographically patterned metal-oxide-semiconductor capacitors and compared directly to conventional nanoscale impedance microscopy. In addition, BE-NIM is applied to a multiwalled carbon nanotube/poly (m -phenylenevinylene-co-2,5-dioctyloxy-p- phenylenevinylene) nanocomposite material, on which the alternating current behavior of individual nanoscale conductive pathways is quantitatively probed.
Original language | English |
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Article number | 233117 |
Pages (from-to) | 1-3 |
Number of pages | 3 |
Journal | Applied Physics Letters |
Volume | 87 |
Issue number | 23 |
DOIs | |
Publication status | Published - 2005 |
ASJC Scopus subject areas
- Physics and Astronomy (miscellaneous)