Bromine functionalized molecular adlayers on hydrogen passivated silicon surfaces

R. Basu, C. R. Kinser, J. D. Tovar, Mark C Hersam

Research output: Contribution to journalArticle

30 Citations (Scopus)

Abstract

Well controlled and characterized organic functionalization is a necessary precondition for the fabrication of many silicon-based molecular electronic and sensing devices. Of particular interest are organic modifications that incorporate bromine since heavy atoms can be directly interrogated by X-ray radiation and organohalides provide synthetic handles through which more chemically elaborate structures may be covalently bound to silicon. This paper specifically considers the functionalization of hydrogen passivated silicon surfaces with 4-bromostyrene. X-ray photoelectron spectroscopy confirms the reaction of 4-bromostyrene with monohydride Si(1 0 0) and Si(1 1 1) surfaces such that the bromine moiety is preserved on top of the organic adlayer. In addition, ultra-high vacuum scanning tunneling microscopy reveals that the 4-bromostyrene molecules assemble into one-dimensional nanostructures on the Si(1 0 0)-2 × 1:H surface. Overall, these experimental results demonstrate that styrene derivatives serve as effective organic molecules for the chemical functionalization of hydrogen passivated silicon surfaces.

Original languageEnglish
Pages (from-to)144-150
Number of pages7
JournalChemical Physics
Volume326
Issue number1
DOIs
Publication statusPublished - Jul 11 2006

Fingerprint

Bromine
Silicon
bromine
Hydrogen
silicon
hydrogen
Molecular electronics
Molecules
Styrene
molecular electronics
Ultrahigh vacuum
Scanning tunneling microscopy
styrenes
ultrahigh vacuum
scanning tunneling microscopy
molecules
Nanostructures
x rays
X ray photoelectron spectroscopy
photoelectron spectroscopy

Keywords

  • 4-Bromostyrene
  • Bromine
  • Hydrogen
  • Molecular electronics
  • Passivation
  • Scanning tunneling microscopy
  • Sensing
  • Si(1 0 0)
  • Si(1 1 1)
  • Silicon
  • STM
  • Styrene
  • UHV
  • Ultra-high vacuum
  • X-ray photoelectron spectroscopy
  • XPS

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Spectroscopy
  • Atomic and Molecular Physics, and Optics

Cite this

Bromine functionalized molecular adlayers on hydrogen passivated silicon surfaces. / Basu, R.; Kinser, C. R.; Tovar, J. D.; Hersam, Mark C.

In: Chemical Physics, Vol. 326, No. 1, 11.07.2006, p. 144-150.

Research output: Contribution to journalArticle

Basu, R. ; Kinser, C. R. ; Tovar, J. D. ; Hersam, Mark C. / Bromine functionalized molecular adlayers on hydrogen passivated silicon surfaces. In: Chemical Physics. 2006 ; Vol. 326, No. 1. pp. 144-150.
@article{51e76023c0da4dde87cfe8486c0d5892,
title = "Bromine functionalized molecular adlayers on hydrogen passivated silicon surfaces",
abstract = "Well controlled and characterized organic functionalization is a necessary precondition for the fabrication of many silicon-based molecular electronic and sensing devices. Of particular interest are organic modifications that incorporate bromine since heavy atoms can be directly interrogated by X-ray radiation and organohalides provide synthetic handles through which more chemically elaborate structures may be covalently bound to silicon. This paper specifically considers the functionalization of hydrogen passivated silicon surfaces with 4-bromostyrene. X-ray photoelectron spectroscopy confirms the reaction of 4-bromostyrene with monohydride Si(1 0 0) and Si(1 1 1) surfaces such that the bromine moiety is preserved on top of the organic adlayer. In addition, ultra-high vacuum scanning tunneling microscopy reveals that the 4-bromostyrene molecules assemble into one-dimensional nanostructures on the Si(1 0 0)-2 × 1:H surface. Overall, these experimental results demonstrate that styrene derivatives serve as effective organic molecules for the chemical functionalization of hydrogen passivated silicon surfaces.",
keywords = "4-Bromostyrene, Bromine, Hydrogen, Molecular electronics, Passivation, Scanning tunneling microscopy, Sensing, Si(1 0 0), Si(1 1 1), Silicon, STM, Styrene, UHV, Ultra-high vacuum, X-ray photoelectron spectroscopy, XPS",
author = "R. Basu and Kinser, {C. R.} and Tovar, {J. D.} and Hersam, {Mark C}",
year = "2006",
month = "7",
day = "11",
doi = "10.1016/j.chemphys.2005.12.023",
language = "English",
volume = "326",
pages = "144--150",
journal = "Chemical Physics",
issn = "0301-0104",
publisher = "Elsevier",
number = "1",

}

TY - JOUR

T1 - Bromine functionalized molecular adlayers on hydrogen passivated silicon surfaces

AU - Basu, R.

AU - Kinser, C. R.

AU - Tovar, J. D.

AU - Hersam, Mark C

PY - 2006/7/11

Y1 - 2006/7/11

N2 - Well controlled and characterized organic functionalization is a necessary precondition for the fabrication of many silicon-based molecular electronic and sensing devices. Of particular interest are organic modifications that incorporate bromine since heavy atoms can be directly interrogated by X-ray radiation and organohalides provide synthetic handles through which more chemically elaborate structures may be covalently bound to silicon. This paper specifically considers the functionalization of hydrogen passivated silicon surfaces with 4-bromostyrene. X-ray photoelectron spectroscopy confirms the reaction of 4-bromostyrene with monohydride Si(1 0 0) and Si(1 1 1) surfaces such that the bromine moiety is preserved on top of the organic adlayer. In addition, ultra-high vacuum scanning tunneling microscopy reveals that the 4-bromostyrene molecules assemble into one-dimensional nanostructures on the Si(1 0 0)-2 × 1:H surface. Overall, these experimental results demonstrate that styrene derivatives serve as effective organic molecules for the chemical functionalization of hydrogen passivated silicon surfaces.

AB - Well controlled and characterized organic functionalization is a necessary precondition for the fabrication of many silicon-based molecular electronic and sensing devices. Of particular interest are organic modifications that incorporate bromine since heavy atoms can be directly interrogated by X-ray radiation and organohalides provide synthetic handles through which more chemically elaborate structures may be covalently bound to silicon. This paper specifically considers the functionalization of hydrogen passivated silicon surfaces with 4-bromostyrene. X-ray photoelectron spectroscopy confirms the reaction of 4-bromostyrene with monohydride Si(1 0 0) and Si(1 1 1) surfaces such that the bromine moiety is preserved on top of the organic adlayer. In addition, ultra-high vacuum scanning tunneling microscopy reveals that the 4-bromostyrene molecules assemble into one-dimensional nanostructures on the Si(1 0 0)-2 × 1:H surface. Overall, these experimental results demonstrate that styrene derivatives serve as effective organic molecules for the chemical functionalization of hydrogen passivated silicon surfaces.

KW - 4-Bromostyrene

KW - Bromine

KW - Hydrogen

KW - Molecular electronics

KW - Passivation

KW - Scanning tunneling microscopy

KW - Sensing

KW - Si(1 0 0)

KW - Si(1 1 1)

KW - Silicon

KW - STM

KW - Styrene

KW - UHV

KW - Ultra-high vacuum

KW - X-ray photoelectron spectroscopy

KW - XPS

UR - http://www.scopus.com/inward/record.url?scp=33745501203&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=33745501203&partnerID=8YFLogxK

U2 - 10.1016/j.chemphys.2005.12.023

DO - 10.1016/j.chemphys.2005.12.023

M3 - Article

AN - SCOPUS:33745501203

VL - 326

SP - 144

EP - 150

JO - Chemical Physics

JF - Chemical Physics

SN - 0301-0104

IS - 1

ER -