Buffers for high temperature superconductor coatings. Low temperature growth of CeO2 films by metal-organic chemical vapor deposition and their implementation as buffers

Anchuan Wang, John A. Belot, Tobin J Marks, Paul R. Markworth, Robert P. H. Chang, Michael P. Chudzik, Carl R. Kannewurf

Research output: Contribution to journalArticle

43 Citations (Scopus)

Abstract

Smooth, epitaxial cerium dioxide thin films have been grown in-situ in the 450-650 °C temperature range on (001) yttria-stabilized zirconia (YSZ) substrates by metal-organic chemical vapor deposition (MOCVD) using a new fluorine-free liquid Ce precursor. As assessed by X-ray diffraction, transmission electron microscopy (TEM), and high-resolution electron microscopy (HREM), the epitaxial films exhibit a columnar microstructure with atomically abrupt film-substrate interfaces and with only minor bending of the crystal plane parallel to the substrate surface near the interface and at the column boundaries. With fixed precursor temperature and gas flow rate, the CeO2 growth rate decreases from approximately 10 angstroms/min at 450 °C to approximately 6.5 angstroms/min at 540 °C. The root-mean-square roughness of the films also decreases from 15.5 angstroms at 450 °C to 4.3 angstroms at 540 °C. High-quality, epitaxial YBa2C3O7-x films have been successfully deposited on these MOCVD-derived CeO2 films grown at temperatures as low as 540 °C. They exhibit Tc = 86.5 K and Jc = 1.08×106 A/cm2 at 77.4 K.

Original languageEnglish
Pages (from-to)154-160
Number of pages7
JournalPhysica C: Superconductivity and its Applications
Volume320
Issue number3
DOIs
Publication statusPublished - Jul 20 1999

ASJC Scopus subject areas

  • Condensed Matter Physics

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