Carbon Films for Use as the Electron Source in a Parallel e-Beam Lithography System

W. I. Milne, K. B K Teo, Manish Chhowalla, G. A J Amaratunga, J. Yuan, J. Robertson, P. Legagneux, G. Pirio, D. Pribat, K. Bouzehouane, W. Bruenger, C. Trautmann

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

The overall aim of this work is to produce a parallel e-beam lithography system using an array of field-emitting microguns independently driven by an active matrix array. This paper will describe the work carried out on optimisation of suitable carbon-based materials for use as the electron emitter source in such a system. From initial experiments on field emission from tetrahedrally bonded amorphous carbon (ta-C) and nanocluster carbon films, it has been deduced that emission occurs from nanometre-size sp2 sites within an insulating sp3 matrix. Hence, we have carried out a series of experiments to investigate the possibility of deliberately producing such sp2 regions within a predominantly sp3 matrix using e-beam irradiation, high energy ion beam irradiation and post deposition plasma processing of ta-C. Unfortunately, although the use of 1GeV uranium ions successfully produced arrays of sp2 rich regions on the required nanometre scale, no preferential field emission from such sites could be obtained. The final series of experiments were thence carried out using aligned carbon nanotubes (CNTs) as the electron sources. Results on aligned CNTs, grown using a dc plasma technique and a Ni catalyst, are presented. Both the diameter and length of the CNTs are dependent upon the thickness of the catalytic layer used. Field emission from an array of CNTs was obtained.

Original languageEnglish
Pages (from-to)235-247
Number of pages13
JournalNew Diamond and Frontier Carbon Technology
Volume11
Issue number4
Publication statusPublished - 2001

Fingerprint

Electron sources
Carbon Nanotubes
electron sources
Carbon films
Lithography
Carbon nanotubes
lithography
carbon nanotubes
Field emission
field emission
carbon
matrices
Irradiation
Plasma applications
Uranium
irradiation
Nanoclusters
Experiments
Amorphous carbon
nanoclusters

Keywords

  • Carbon nanotubes
  • Diamond-like carbon
  • Field emission

ASJC Scopus subject areas

  • Materials Science(all)
  • Surfaces, Coatings and Films
  • Surfaces and Interfaces

Cite this

Milne, W. I., Teo, K. B. K., Chhowalla, M., Amaratunga, G. A. J., Yuan, J., Robertson, J., ... Trautmann, C. (2001). Carbon Films for Use as the Electron Source in a Parallel e-Beam Lithography System. New Diamond and Frontier Carbon Technology, 11(4), 235-247.

Carbon Films for Use as the Electron Source in a Parallel e-Beam Lithography System. / Milne, W. I.; Teo, K. B K; Chhowalla, Manish; Amaratunga, G. A J; Yuan, J.; Robertson, J.; Legagneux, P.; Pirio, G.; Pribat, D.; Bouzehouane, K.; Bruenger, W.; Trautmann, C.

In: New Diamond and Frontier Carbon Technology, Vol. 11, No. 4, 2001, p. 235-247.

Research output: Contribution to journalArticle

Milne, WI, Teo, KBK, Chhowalla, M, Amaratunga, GAJ, Yuan, J, Robertson, J, Legagneux, P, Pirio, G, Pribat, D, Bouzehouane, K, Bruenger, W & Trautmann, C 2001, 'Carbon Films for Use as the Electron Source in a Parallel e-Beam Lithography System', New Diamond and Frontier Carbon Technology, vol. 11, no. 4, pp. 235-247.
Milne, W. I. ; Teo, K. B K ; Chhowalla, Manish ; Amaratunga, G. A J ; Yuan, J. ; Robertson, J. ; Legagneux, P. ; Pirio, G. ; Pribat, D. ; Bouzehouane, K. ; Bruenger, W. ; Trautmann, C. / Carbon Films for Use as the Electron Source in a Parallel e-Beam Lithography System. In: New Diamond and Frontier Carbon Technology. 2001 ; Vol. 11, No. 4. pp. 235-247.
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