Carbon Films for Use as the Electron Source in a Parallel e-Beam Lithography System

W. I. Milne, K. B.K. Teo, M. Chhowalla, G. A.J. Amaratunga, J. Yuan, J. Robertson, P. Legagneux, G. Pirio, D. Pribat, K. Bouzehouane, W. Bruenger, C. Trautmann

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