Characterization of phosphosilicate thin films using confocal Raman microscopy

Manyalibo J. Matthews, Alex Harris, Allan J. Bruce, Mark J. Cardillo

Research output: Contribution to journalArticle

12 Citations (Scopus)

Abstract

We have demonstrated a characterization tool based on confocal Raman microscopy capable of studying the vibrational spectrum of silica-on-silicon-based thin films within a confined, ∼1 μm3-size volume beneath the sample surface. The Raman spectra of a set of phosphosilicate thin film samples have been quantitatively analyzed and correlated with both phosphorus concentration Cp and refractive index n, as determined by conventional methods. The normalized intensity of the P=O vibration scaled linearly with Cp and n, and allowed for the calibration of the Raman measurements to a precision of ∼0.2 wt. %P and ∼ 10-4 in index. The capability of this technique for studying index and dopant profiles in arbitrary systems is also discussed.

Original languageEnglish
Pages (from-to)2117-2120
Number of pages4
JournalReview of Scientific Instruments
Volume71
Issue number5
Publication statusPublished - May 2000

Fingerprint

Microscopic examination
microscopy
Thin films
Vibrational spectra
thin films
Phosphorus
Raman scattering
Refractive index
Silica
Doping (additives)
Calibration
Silicon
vibrational spectra
phosphorus
refractivity
Raman spectra
silicon dioxide
vibration
silicon
profiles

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)
  • Instrumentation

Cite this

Characterization of phosphosilicate thin films using confocal Raman microscopy. / Matthews, Manyalibo J.; Harris, Alex; Bruce, Allan J.; Cardillo, Mark J.

In: Review of Scientific Instruments, Vol. 71, No. 5, 05.2000, p. 2117-2120.

Research output: Contribution to journalArticle

Matthews, MJ, Harris, A, Bruce, AJ & Cardillo, MJ 2000, 'Characterization of phosphosilicate thin films using confocal Raman microscopy', Review of Scientific Instruments, vol. 71, no. 5, pp. 2117-2120.
Matthews, Manyalibo J. ; Harris, Alex ; Bruce, Allan J. ; Cardillo, Mark J. / Characterization of phosphosilicate thin films using confocal Raman microscopy. In: Review of Scientific Instruments. 2000 ; Vol. 71, No. 5. pp. 2117-2120.
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