Characterization of plasma-enhanced chemical vapor deposition carbon nanotubes by Auger electron spectroscopy

K. B.K. Teo, M. Chhowalla, G. A.J. Amaratunga, W. I. Milne, G. Pirio, P. Legagneux, F. Wyczisk, J. Olivier, D. Pribat

Research output: Contribution to journalConference article

79 Citations (Scopus)

Abstract

The characterization of plasma enhanced chemical vapor deposition (PECVD) deposited nanotubes using Auger Electron Spectroscopy (AES) was presented. The grown nanotubes followed a tip-growth mechanism with a high degree of crystallinity detected in the bodies and same in the heads. By adjusting the deposition gas ratios, it was shown that it was possible to eliminate the unwanted amorphous carbon on the substrate surface.

Original languageEnglish
Pages (from-to)116-121
Number of pages6
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume20
Issue number1
DOIs
Publication statusPublished - Jan 1 2002
Event6th International Workshop on Fabrication, Characterization, and Modeling of Ultra-Shallow Doping Profiles in Semiconductors - Napa Valley, CA, United States
Duration: Apr 22 2001Apr 26 2001

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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