Characterization of plasma-enhanced chemical vapor deposition carbon nanotubes by Auger electron spectroscopy

K. B K Teo, Manish Chhowalla, G. A J Amaratunga, W. I. Milne, G. Pirio, P. Legagneux, F. Wyczisk, J. Olivier, D. Pribat

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The characterization of plasma enhanced chemical vapor deposition (PECVD) deposited nanotubes using Auger Electron Spectroscopy (AES) was presented. The grown nanotubes followed a tip-growth mechanism with a high degree of crystallinity detected in the bodies and same in the heads. By adjusting the deposition gas ratios, it was shown that it was possible to eliminate the unwanted amorphous carbon on the substrate surface.

Original languageEnglish
Pages (from-to)116-121
Number of pages6
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Issue number1
Publication statusPublished - Jan 2002


ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Surfaces and Interfaces
  • Physics and Astronomy (miscellaneous)

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