Chemically amplified dehydration of thin oxide films

Jeremy T. Anderson; Wei Wang; Kai Jiang; Torgny Gustafsson; Can Xu; Eric L. Gafunkel; Douglas A. Keszler

doi:10.1021/sc500824a

Chemically amplified dehydration of thin oxide films

Jeremy T. Anderson, Wei Wang, Kai Jiang, Torgny Gustafsson, Can Xu, Eric L. Gafunkel, Douglas A. Keszler

Rutgers University

Research output: Contribution to journal › Article › peer-review

10 Citations (Scopus)

Abstract

The hydrous material Al(PO₄)_0.6O_0.6·zH₂O (AlPO) is studied in thin-film form to determine whether bulk diffusion or near-surface densification controls thermal dehydration. From X-ray reflectivity measurements, a dense surface crust is found to form on heating AlPO films. Capacitance-voltage measurements reveal the presence of mobile protons associated with trapped OH and H₂O in the films. Deposition of a thin solution-processed HfO₂ top coat on the AlPO film lowers the dehydration temperature by 250 °C. Characterization of the AlPO/HfO₂ interface by medium energy ion scattering and transmission electron microscopy reveals little interdiffusion between the layers. The top coat affects densification of the near-surface region of the AlPO film, thereby amplifying water loss at low temperatures.

Original language	English
Pages (from-to)	1081-1085
Number of pages	5
Journal	ACS Sustainable Chemistry and Engineering
Volume	3
Issue number	6
DOIs	https://doi.org/10.1021/sc500824a
Publication status	Published - Jun 1 2015

Keywords

Aqueous processing
Electronic materials
Oxide films

ASJC Scopus subject areas

Chemistry(all)
Environmental Chemistry
Chemical Engineering(all)
Renewable Energy, Sustainability and the Environment

Access to Document

10.1021/sc500824a

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title = "Chemically amplified dehydration of thin oxide films",

abstract = "The hydrous material Al(PO4)0.6O0.6·zH2O (AlPO) is studied in thin-film form to determine whether bulk diffusion or near-surface densification controls thermal dehydration. From X-ray reflectivity measurements, a dense surface crust is found to form on heating AlPO films. Capacitance-voltage measurements reveal the presence of mobile protons associated with trapped OH and H2O in the films. Deposition of a thin solution-processed HfO2 top coat on the AlPO film lowers the dehydration temperature by 250 °C. Characterization of the AlPO/HfO2 interface by medium energy ion scattering and transmission electron microscopy reveals little interdiffusion between the layers. The top coat affects densification of the near-surface region of the AlPO film, thereby amplifying water loss at low temperatures.",

keywords = "Aqueous processing, Electronic materials, Oxide films",

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AU - Anderson, Jeremy T.

AU - Wang, Wei

AU - Jiang, Kai

AU - Gustafsson, Torgny

AU - Xu, Can

AU - Gafunkel, Eric L.

AU - Keszler, Douglas A.

PY - 2015/6/1

Y1 - 2015/6/1

N2 - The hydrous material Al(PO4)0.6O0.6·zH2O (AlPO) is studied in thin-film form to determine whether bulk diffusion or near-surface densification controls thermal dehydration. From X-ray reflectivity measurements, a dense surface crust is found to form on heating AlPO films. Capacitance-voltage measurements reveal the presence of mobile protons associated with trapped OH and H2O in the films. Deposition of a thin solution-processed HfO2 top coat on the AlPO film lowers the dehydration temperature by 250 °C. Characterization of the AlPO/HfO2 interface by medium energy ion scattering and transmission electron microscopy reveals little interdiffusion between the layers. The top coat affects densification of the near-surface region of the AlPO film, thereby amplifying water loss at low temperatures.

AB - The hydrous material Al(PO4)0.6O0.6·zH2O (AlPO) is studied in thin-film form to determine whether bulk diffusion or near-surface densification controls thermal dehydration. From X-ray reflectivity measurements, a dense surface crust is found to form on heating AlPO films. Capacitance-voltage measurements reveal the presence of mobile protons associated with trapped OH and H2O in the films. Deposition of a thin solution-processed HfO2 top coat on the AlPO film lowers the dehydration temperature by 250 °C. Characterization of the AlPO/HfO2 interface by medium energy ion scattering and transmission electron microscopy reveals little interdiffusion between the layers. The top coat affects densification of the near-surface region of the AlPO film, thereby amplifying water loss at low temperatures.

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KW - Electronic materials

KW - Oxide films

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