Chlorination of hydrogen-terminated silicon (111) surfaces

Sandrine Rivillon, Yves J. Chabal, Lauren J. Webb, David J. Michalak, Nathan S Lewis, Mathew D. Halls, Krishnan Raghavachari

Research output: Contribution to journalArticle

61 Citations (Scopus)

Abstract

Infrared absorption spectroscopy was used to investigate the chlorination of hydrogen-terminated Si(111) surfaces by three different methods: (a) exposure to a saturated solution of phosphorus pentachloride (P Cl5) in chlorobenzene; (b) exposure to chlorine gas, Cl2 (g), and (c) exposure to Cl2 (g) under UV illumination. X-ray photoelectron spectroscopy and first principles model (clusters) calculations were used to explore the structure and dynamics of these surfaces. The infrared spectra exhibited sharp chlorine-related vibrations at 586 and 527 cm-1. The narrow full width at half maximum of these vibrations for all three preparation methods indicated that all functionalization schemes produced a nearly complete monolayer of Cl with little surface roughening or introduction of step edges. The 527 cm-1 mode was at a much higher frequency than might be expected for the bending vibration of Si monochloride. Theoretical calculations show, however, that this vibration involves the displacement of the top Si atom parallel to the surface, subject to a relatively stiff potential, shifting its frequency to a value fairly close to that of the Si-Cl stretching mode on a Si(111) surface.

Original languageEnglish
Pages (from-to)1100-1106
Number of pages7
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume23
Issue number4
DOIs
Publication statusPublished - Jul 2005

Fingerprint

chlorination
Chlorination
Silicon
Hydrogen
silicon
hydrogen
Chlorine
vibration
chlorine
chlorobenzenes
bending vibration
Infrared absorption
Full width at half maximum
Absorption spectroscopy
Phosphorus
infrared absorption
Stretching
phosphorus
Infrared spectroscopy
Monolayers

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Surfaces and Interfaces
  • Physics and Astronomy (miscellaneous)

Cite this

Rivillon, S., Chabal, Y. J., Webb, L. J., Michalak, D. J., Lewis, N. S., Halls, M. D., & Raghavachari, K. (2005). Chlorination of hydrogen-terminated silicon (111) surfaces. Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 23(4), 1100-1106. https://doi.org/10.1116/1.1861941

Chlorination of hydrogen-terminated silicon (111) surfaces. / Rivillon, Sandrine; Chabal, Yves J.; Webb, Lauren J.; Michalak, David J.; Lewis, Nathan S; Halls, Mathew D.; Raghavachari, Krishnan.

In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 23, No. 4, 07.2005, p. 1100-1106.

Research output: Contribution to journalArticle

Rivillon, S, Chabal, YJ, Webb, LJ, Michalak, DJ, Lewis, NS, Halls, MD & Raghavachari, K 2005, 'Chlorination of hydrogen-terminated silicon (111) surfaces', Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, vol. 23, no. 4, pp. 1100-1106. https://doi.org/10.1116/1.1861941
Rivillon, Sandrine ; Chabal, Yves J. ; Webb, Lauren J. ; Michalak, David J. ; Lewis, Nathan S ; Halls, Mathew D. ; Raghavachari, Krishnan. / Chlorination of hydrogen-terminated silicon (111) surfaces. In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 2005 ; Vol. 23, No. 4. pp. 1100-1106.
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