[(CH3)5C5]2Th(CH 3)2/silica surface chemistry. High-resolution 13C CPMAS NMR evidence for alkylation of surface silicon sites

Paul J. Toscano, Tobin J Marks

Research output: Contribution to journalArticle

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Abstract

The reaction of Cp′2Th(13CH3)2 (Cp′ = η5-Me5C5) with dehydroxylated silica (ca. 0.4 surface OH/nm2) has been studied by high-resolution 13C CPMAS NMR spectroscopy. On the basis of 13C chemical shifts, relative signal intensities, and NMR data from model compounds and model reactions, it is proposed that the predominant adsorption pathway involves methyl transfer from thorium to surface silicon sites. The products of this Si-O cleavage process are surface Si-CH3 and Cp′2Th(CH3)-siloxide functionalities. The resulting thorium environment appears to be somewhat more electron rich than in the analogous surface complex on dehydroxylated γ-alumina.

Original languageEnglish
Pages (from-to)820-823
Number of pages4
JournalLangmuir
Volume2
Issue number6
Publication statusPublished - 1986

Fingerprint

alkylation
Alkylation
Silicon
Surface chemistry
Silicon Dioxide
Silica
Nuclear magnetic resonance
chemistry
Thorium
silicon dioxide
nuclear magnetic resonance
high resolution
thorium
silicon
Aluminum Oxide
Chemical shift
Nuclear magnetic resonance spectroscopy
chemical equilibrium
cleavage
Alumina

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Colloid and Surface Chemistry

Cite this

[(CH3)5C5]2Th(CH 3)2/silica surface chemistry. High-resolution 13C CPMAS NMR evidence for alkylation of surface silicon sites. / Toscano, Paul J.; Marks, Tobin J.

In: Langmuir, Vol. 2, No. 6, 1986, p. 820-823.

Research output: Contribution to journalArticle

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