Conductive atomic force microscope nanopatterning of hydrogen-passivated silicon in inert organic solvents

C. Reagan Kinser, Matthew J. Schmitz, Mark C. Hersam

Research output: Contribution to journalArticle

43 Citations (Scopus)

Abstract

Ambient liquid phase atomic force microscope (AFM) techniques for nanopatterning organic molecules on silicon through direct Si-C bonds rely on reactions that are in direct competition with spurious oxidation. We study the effectiveness of an inert hydrophobic organic solvent at suppressing oxidation of hydrogen-passivated silicon under ambient conditions. Nanometer scale features were fabricated on an H:Si(111) substrate using a conductive AFM in hexadecane. The patterned features show chemical and kinetic behavior consistent with field induced oxidation (FIO) in air. The mechanism for FIO in hexadecane is discussed.

Original languageEnglish
Pages (from-to)91-95
Number of pages5
JournalNano letters
Volume5
Issue number1
DOIs
Publication statusPublished - Jan 1 2005

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ASJC Scopus subject areas

  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanical Engineering

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