Connectivity of features in microlens array reduction photolithography: Generation of various patterns with a single photomask

Hongkai Wu, Teri W Odom, George M. Whitesides

Research output: Contribution to journalArticle

41 Citations (Scopus)

Abstract

Microlens array photolithography (MAP) is a technique in which arrays of microlenses positioned close to photoresist reduce cm-sized figures on photomasks and form μm-scale images in the photoresist. This work demonstrates that MAP, using a single photomask, can generate patterns having different symmetries and periodicities from that of the lens array. This capability of MAP depends on (i) the connectivity between the images produced by individual microlenses and (ii) the orientation of the photomask relative to the lens array prior to exposure. By changing this orientation, MAP, using a single mask and a single array of microlenses, could be used to generate patterns that (i) are separated from each other, (ii) overlap with each other, (iii) are 2D chiral, and thus different from both the lens array and the mask in symmetry, (iv) have a symmetry reduced from that of the lens array, or (v) have a smaller unit cell and smaller pitch than that of the lens array.

Original languageEnglish
Pages (from-to)7288-7289
Number of pages2
JournalJournal of the American Chemical Society
Volume124
Issue number25
DOIs
Publication statusPublished - Jun 26 2002

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Photomasks
Photolithography
Lenses
Microlenses
Photoresists
Masks
Periodicity

ASJC Scopus subject areas

  • Chemistry(all)

Cite this

Connectivity of features in microlens array reduction photolithography : Generation of various patterns with a single photomask. / Wu, Hongkai; Odom, Teri W; Whitesides, George M.

In: Journal of the American Chemical Society, Vol. 124, No. 25, 26.06.2002, p. 7288-7289.

Research output: Contribution to journalArticle

@article{2c06363b03fc46ec822a2c112782bc87,
title = "Connectivity of features in microlens array reduction photolithography: Generation of various patterns with a single photomask",
abstract = "Microlens array photolithography (MAP) is a technique in which arrays of microlenses positioned close to photoresist reduce cm-sized figures on photomasks and form μm-scale images in the photoresist. This work demonstrates that MAP, using a single photomask, can generate patterns having different symmetries and periodicities from that of the lens array. This capability of MAP depends on (i) the connectivity between the images produced by individual microlenses and (ii) the orientation of the photomask relative to the lens array prior to exposure. By changing this orientation, MAP, using a single mask and a single array of microlenses, could be used to generate patterns that (i) are separated from each other, (ii) overlap with each other, (iii) are 2D chiral, and thus different from both the lens array and the mask in symmetry, (iv) have a symmetry reduced from that of the lens array, or (v) have a smaller unit cell and smaller pitch than that of the lens array.",
author = "Hongkai Wu and Odom, {Teri W} and Whitesides, {George M.}",
year = "2002",
month = "6",
day = "26",
doi = "10.1021/ja020551k",
language = "English",
volume = "124",
pages = "7288--7289",
journal = "Journal of the American Chemical Society",
issn = "0002-7863",
publisher = "American Chemical Society",
number = "25",

}

TY - JOUR

T1 - Connectivity of features in microlens array reduction photolithography

T2 - Generation of various patterns with a single photomask

AU - Wu, Hongkai

AU - Odom, Teri W

AU - Whitesides, George M.

PY - 2002/6/26

Y1 - 2002/6/26

N2 - Microlens array photolithography (MAP) is a technique in which arrays of microlenses positioned close to photoresist reduce cm-sized figures on photomasks and form μm-scale images in the photoresist. This work demonstrates that MAP, using a single photomask, can generate patterns having different symmetries and periodicities from that of the lens array. This capability of MAP depends on (i) the connectivity between the images produced by individual microlenses and (ii) the orientation of the photomask relative to the lens array prior to exposure. By changing this orientation, MAP, using a single mask and a single array of microlenses, could be used to generate patterns that (i) are separated from each other, (ii) overlap with each other, (iii) are 2D chiral, and thus different from both the lens array and the mask in symmetry, (iv) have a symmetry reduced from that of the lens array, or (v) have a smaller unit cell and smaller pitch than that of the lens array.

AB - Microlens array photolithography (MAP) is a technique in which arrays of microlenses positioned close to photoresist reduce cm-sized figures on photomasks and form μm-scale images in the photoresist. This work demonstrates that MAP, using a single photomask, can generate patterns having different symmetries and periodicities from that of the lens array. This capability of MAP depends on (i) the connectivity between the images produced by individual microlenses and (ii) the orientation of the photomask relative to the lens array prior to exposure. By changing this orientation, MAP, using a single mask and a single array of microlenses, could be used to generate patterns that (i) are separated from each other, (ii) overlap with each other, (iii) are 2D chiral, and thus different from both the lens array and the mask in symmetry, (iv) have a symmetry reduced from that of the lens array, or (v) have a smaller unit cell and smaller pitch than that of the lens array.

UR - http://www.scopus.com/inward/record.url?scp=0037178057&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0037178057&partnerID=8YFLogxK

U2 - 10.1021/ja020551k

DO - 10.1021/ja020551k

M3 - Article

C2 - 12071735

AN - SCOPUS:0037178057

VL - 124

SP - 7288

EP - 7289

JO - Journal of the American Chemical Society

JF - Journal of the American Chemical Society

SN - 0002-7863

IS - 25

ER -