Connectivity of features in microlens array reduction photolithography: Generation of various patterns with a single photomask

Hongkai Wu, Teri W Odom, George M. Whitesides

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Abstract

Microlens array photolithography (MAP) is a technique in which arrays of microlenses positioned close to photoresist reduce cm-sized figures on photomasks and form μm-scale images in the photoresist. This work demonstrates that MAP, using a single photomask, can generate patterns having different symmetries and periodicities from that of the lens array. This capability of MAP depends on (i) the connectivity between the images produced by individual microlenses and (ii) the orientation of the photomask relative to the lens array prior to exposure. By changing this orientation, MAP, using a single mask and a single array of microlenses, could be used to generate patterns that (i) are separated from each other, (ii) overlap with each other, (iii) are 2D chiral, and thus different from both the lens array and the mask in symmetry, (iv) have a symmetry reduced from that of the lens array, or (v) have a smaller unit cell and smaller pitch than that of the lens array.

Original languageEnglish
Pages (from-to)7288-7289
Number of pages2
JournalJournal of the American Chemical Society
Volume124
Issue number25
DOIs
Publication statusPublished - Jun 26 2002

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ASJC Scopus subject areas

  • Chemistry(all)

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