Control of the pH-dependence of the band edges of Si(111) surfaces using mixed methyl/allyl monolayers

Erik Johansson, Shannon W. Boettcher, Leslie E. O'Leary, Andrey D. Poletayev, Stephen Maldonado, Bruce S. Brunschwig, Nathan S Lewis

Research output: Contribution to journalArticle

28 Citations (Scopus)

Abstract

The open-circuit potentials of p-Si/((MV2+/MV+) (aq)) junctions with Si(111) surfaces functionalized with H-, CH 3-, CH2CHCH2-, or mixed CH3-/CH 2CHCH2- monolayers have been investigated as the solution pH was changed from 2.5 to 11. The pH sensitivity of the open-circuit potentials, and therefore the band-edge positions, was anticorrelated with the total fraction of Si atop sites that were terminated by Si-C bonds. This behavior is consistent with the hypothesis that the non Si-C terminated atop sites were initially H-terminated and were unstable to oxide growth under aqueous conditions with the oxidation-product inducing a pH-dependent dipole. Metal-semiconductor junctions between Hg and CH3-, CH 2CHCH2-, or mixed CH3-/CH2CHCH 2-terminated n-Si(111) surfaces formed rectifying Hg/Si Schottky junctions and exhibited mutually similar barrier-heights (̃0.9 V), suggesting similar magnitudes and direction of the surface dipoles on all of these functionalized surfaces.

Original languageEnglish
Pages (from-to)8594-8601
Number of pages8
JournalJournal of Physical Chemistry C
Volume115
Issue number17
DOIs
Publication statusPublished - May 5 2011

Fingerprint

Monolayers
methylidyne
Semiconductor junctions
dipoles
semiconductor junctions
Networks (circuits)
Oxides
Metals
Oxidation
oxidation
oxides
sensitivity
products
metals

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Electronic, Optical and Magnetic Materials
  • Surfaces, Coatings and Films
  • Energy(all)

Cite this

Johansson, E., Boettcher, S. W., O'Leary, L. E., Poletayev, A. D., Maldonado, S., Brunschwig, B. S., & Lewis, N. S. (2011). Control of the pH-dependence of the band edges of Si(111) surfaces using mixed methyl/allyl monolayers. Journal of Physical Chemistry C, 115(17), 8594-8601. https://doi.org/10.1021/jp109799e

Control of the pH-dependence of the band edges of Si(111) surfaces using mixed methyl/allyl monolayers. / Johansson, Erik; Boettcher, Shannon W.; O'Leary, Leslie E.; Poletayev, Andrey D.; Maldonado, Stephen; Brunschwig, Bruce S.; Lewis, Nathan S.

In: Journal of Physical Chemistry C, Vol. 115, No. 17, 05.05.2011, p. 8594-8601.

Research output: Contribution to journalArticle

Johansson, E, Boettcher, SW, O'Leary, LE, Poletayev, AD, Maldonado, S, Brunschwig, BS & Lewis, NS 2011, 'Control of the pH-dependence of the band edges of Si(111) surfaces using mixed methyl/allyl monolayers', Journal of Physical Chemistry C, vol. 115, no. 17, pp. 8594-8601. https://doi.org/10.1021/jp109799e
Johansson E, Boettcher SW, O'Leary LE, Poletayev AD, Maldonado S, Brunschwig BS et al. Control of the pH-dependence of the band edges of Si(111) surfaces using mixed methyl/allyl monolayers. Journal of Physical Chemistry C. 2011 May 5;115(17):8594-8601. https://doi.org/10.1021/jp109799e
Johansson, Erik ; Boettcher, Shannon W. ; O'Leary, Leslie E. ; Poletayev, Andrey D. ; Maldonado, Stephen ; Brunschwig, Bruce S. ; Lewis, Nathan S. / Control of the pH-dependence of the band edges of Si(111) surfaces using mixed methyl/allyl monolayers. In: Journal of Physical Chemistry C. 2011 ; Vol. 115, No. 17. pp. 8594-8601.
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