Deep Ultraviolet Nonlinear Optical Materials

T. Thao Tran, Hongwei Yu, James M. Rondinelli, Kenneth R Poeppelmeier, P. Shiv Halasyamani

Research output: Contribution to journalReview article

135 Citations (Scopus)

Abstract

Deep ultraviolet (absorption edge <200 nm, band gap >6.2 eV) nonlinear optical (NLO) materials are of current interest owing to their technological applications and materials design challenges. Technologically, the materials are used in laser systems, atto-second pulse generation, semiconductor manufacturing, and photolithography. Designing and synthesizing a deep UV NLO material requires crystallographic non-centrosymmetry, a wide UV transparency range, a large second-harmonic generating coefficient (dij > 0.39 pm/V), moderate birefringence (δn ∼ 0.07), chemical stability and resistance to laser damage, and ease in the growth of large high-quality single crystals. This review examines the known deep UV NLO materials with respect to their crystal structure, band gap, SHG efficiency, laser damage threshold, and birefringence. Finally, future directions with respect to new deep UV NLO materials are discussed.

Original languageEnglish
Pages (from-to)5238-5258
Number of pages21
JournalChemistry of Materials
Volume28
Issue number15
DOIs
Publication statusPublished - Aug 9 2016

Fingerprint

Optical materials
Laser damage
Birefringence
Chemical resistance
Chemical stability
Photolithography
Transparency
Laser pulses
Energy gap
Crystal structure
Single crystals
Semiconductor materials
Lasers

ASJC Scopus subject areas

  • Chemistry(all)
  • Chemical Engineering(all)
  • Materials Chemistry

Cite this

Tran, T. T., Yu, H., Rondinelli, J. M., Poeppelmeier, K. R., & Halasyamani, P. S. (2016). Deep Ultraviolet Nonlinear Optical Materials. Chemistry of Materials, 28(15), 5238-5258. https://doi.org/10.1021/acs.chemmater.6b02366

Deep Ultraviolet Nonlinear Optical Materials. / Tran, T. Thao; Yu, Hongwei; Rondinelli, James M.; Poeppelmeier, Kenneth R; Halasyamani, P. Shiv.

In: Chemistry of Materials, Vol. 28, No. 15, 09.08.2016, p. 5238-5258.

Research output: Contribution to journalReview article

Tran, TT, Yu, H, Rondinelli, JM, Poeppelmeier, KR & Halasyamani, PS 2016, 'Deep Ultraviolet Nonlinear Optical Materials', Chemistry of Materials, vol. 28, no. 15, pp. 5238-5258. https://doi.org/10.1021/acs.chemmater.6b02366
Tran, T. Thao ; Yu, Hongwei ; Rondinelli, James M. ; Poeppelmeier, Kenneth R ; Halasyamani, P. Shiv. / Deep Ultraviolet Nonlinear Optical Materials. In: Chemistry of Materials. 2016 ; Vol. 28, No. 15. pp. 5238-5258.
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