Deposition of high-Tc superconducting Y-Ba-Cu-O thin films at low temperatures using a plasma-enhanced organometallic chemical vapor deposition approach

Jing Zhao, Henry O. Marcy, Lauren M. Tonge, Bruce W. Wessels, Tobin J Marks, Carl R. Kannewurf

Research output: Contribution to journalArticle

10 Citations (Scopus)

Abstract

A plasma-enhanced organometallic chemical vapor deposition process is reported for the preparation of YBa2Cu3O7-x thin films using two differing rf plasma coupling configurations. For films grown under a direct plasma glow, the YBa2Cu3O7-x phase is not produced in the asdeposited state. However, when plasma-activated nitrous oxide is used as the reactant gas in a downstream reactor configuration, superconducting YBa2Cu3O7-x films are formed in situ at a substrate temperature of 610°C. Such films have a low carbon content and a mirror-like surface which is free of voids. These preliminary results indicate that the low temperature fabrication of high-Tc superconducting oxide films by plasma-enhanced organometallic chemical vapor deposition is feasible.

Original languageEnglish
Pages (from-to)1091-1094
Number of pages4
JournalSolid State Communications
Volume74
Issue number10
DOIs
Publication statusPublished - 1990

Fingerprint

Organometallics
Chemical vapor deposition
vapor deposition
Plasmas
Thin films
thin films
Temperature
Superconducting films
nitrous oxides
Nitrous Oxide
configurations
Oxide films
oxide films
voids
Mirrors
Carbon
Gases
reactors
luminescence
mirrors

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics

Cite this

Deposition of high-Tc superconducting Y-Ba-Cu-O thin films at low temperatures using a plasma-enhanced organometallic chemical vapor deposition approach. / Zhao, Jing; Marcy, Henry O.; Tonge, Lauren M.; Wessels, Bruce W.; Marks, Tobin J; Kannewurf, Carl R.

In: Solid State Communications, Vol. 74, No. 10, 1990, p. 1091-1094.

Research output: Contribution to journalArticle

Zhao, Jing ; Marcy, Henry O. ; Tonge, Lauren M. ; Wessels, Bruce W. ; Marks, Tobin J ; Kannewurf, Carl R. / Deposition of high-Tc superconducting Y-Ba-Cu-O thin films at low temperatures using a plasma-enhanced organometallic chemical vapor deposition approach. In: Solid State Communications. 1990 ; Vol. 74, No. 10. pp. 1091-1094.
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