Deposition of high-Tc superconducting Y-Ba-Cu-O thin films at low temperatures using a plasma-enhanced organometallic chemical vapor deposition approach

Jing Zhao, Henry O. Marcy, Lauren M. Tonge, Bruce W. Wessels, Tobin J Marks, Carl R. Kannewurf

Research output: Contribution to journalArticle

10 Citations (Scopus)


A plasma-enhanced organometallic chemical vapor deposition process is reported for the preparation of YBa2Cu3O7-x thin films using two differing rf plasma coupling configurations. For films grown under a direct plasma glow, the YBa2Cu3O7-x phase is not produced in the asdeposited state. However, when plasma-activated nitrous oxide is used as the reactant gas in a downstream reactor configuration, superconducting YBa2Cu3O7-x films are formed in situ at a substrate temperature of 610°C. Such films have a low carbon content and a mirror-like surface which is free of voids. These preliminary results indicate that the low temperature fabrication of high-Tc superconducting oxide films by plasma-enhanced organometallic chemical vapor deposition is feasible.

Original languageEnglish
Pages (from-to)1091-1094
Number of pages4
JournalSolid State Communications
Issue number10
Publication statusPublished - 1990


ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics

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