Deposition of potassium niobate thin films by metalorganic chemical vapor deposition and their nonlinear optical properties

M. J. Nystrom, B. W. Wessels, J. Chen, D. Studebaker, T. J. Marks, W. P. Lin, G. K. Wong

Research output: Contribution to journalConference article


Ferroelectric potassium niobate thin films have been deposited by conventional, low pressure metalorganic chemical vapor deposition on several types of oxide substrates. The films were epitaxial with a c-axis orientation normal to the substrate. Atomic force microscopy revealed a surface roughness of 1 - 4 nm. Transmission electron microscopy showed the film/substrate interface to be semi-coherent with lattice misfit accommodated by misfit dislocations. The nonlinear optical properties of the KNbO3 films were measured by a transmission technique. The room temperature, effective second order nonlinear coefficient was 13 pm/V.

Original languageEnglish
Pages (from-to)183-188
Number of pages6
JournalMaterials Research Society Symposium - Proceedings
Publication statusPublished - Jan 1 1995
EventProceedings of the 1995 MRS Spring Meeting - San Francisco, CA, USA
Duration: Apr 17 1995Apr 21 1995


ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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