Deposition of potassium niobate thin films by metalorganic chemical vapor deposition and their nonlinear optical properties

M. J. Nystrom; B. W. Wessels; J. Chen; D. Studebaker; T. J. Marks; W. P. Lin; G. K. Wong

doi:10.1557/proc-392-183

Deposition of potassium niobate thin films by metalorganic chemical vapor deposition and their nonlinear optical properties

M. J. Nystrom, B. W. Wessels, J. Chen, D. Studebaker, T. J. Marks, W. P. Lin, G. K. Wong

Northwestern University

Research output: Contribution to journal › Conference article › peer-review

3 Citations (Scopus)

Abstract

Ferroelectric potassium niobate thin films have been deposited by conventional, low pressure metalorganic chemical vapor deposition on several types of oxide substrates. The films were epitaxial with a c-axis orientation normal to the substrate. Atomic force microscopy revealed a surface roughness of 1 - 4 nm. Transmission electron microscopy showed the film/substrate interface to be semi-coherent with lattice misfit accommodated by misfit dislocations. The nonlinear optical properties of the KNbO₃ films were measured by a transmission technique. The room temperature, effective second order nonlinear coefficient was 13 pm/V.

Original language	English
Pages (from-to)	183-188
Number of pages	6
Journal	Materials Research Society Symposium - Proceedings
Volume	392
DOIs	https://doi.org/10.1557/proc-392-183
Publication status	Published - Jan 1 1995
Event	Proceedings of the 1995 MRS Spring Meeting - San Francisco, CA, USA Duration: Apr 17 1995 → Apr 21 1995

ASJC Scopus subject areas

Materials Science(all)
Condensed Matter Physics
Mechanics of Materials
Mechanical Engineering

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Deposition of potassium niobate thin films by metalorganic chemical vapor deposition and their nonlinear optical properties. / Nystrom, M. J.; Wessels, B. W.; Chen, J.; Studebaker, D.; Marks, T. J.; Lin, W. P.; Wong, G. K.

In: Materials Research Society Symposium - Proceedings, Vol. 392, 01.01.1995, p. 183-188.

Research output: Contribution to journal › Conference article › peer-review

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abstract = "Ferroelectric potassium niobate thin films have been deposited by conventional, low pressure metalorganic chemical vapor deposition on several types of oxide substrates. The films were epitaxial with a c-axis orientation normal to the substrate. Atomic force microscopy revealed a surface roughness of 1 - 4 nm. Transmission electron microscopy showed the film/substrate interface to be semi-coherent with lattice misfit accommodated by misfit dislocations. The nonlinear optical properties of the KNbO3 films were measured by a transmission technique. The room temperature, effective second order nonlinear coefficient was 13 pm/V.",

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AB - Ferroelectric potassium niobate thin films have been deposited by conventional, low pressure metalorganic chemical vapor deposition on several types of oxide substrates. The films were epitaxial with a c-axis orientation normal to the substrate. Atomic force microscopy revealed a surface roughness of 1 - 4 nm. Transmission electron microscopy showed the film/substrate interface to be semi-coherent with lattice misfit accommodated by misfit dislocations. The nonlinear optical properties of the KNbO3 films were measured by a transmission technique. The room temperature, effective second order nonlinear coefficient was 13 pm/V.

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