Desorption of H from Si(111) by resonant excitation of the Si-H vibrational stretch mode

Zhiheng Liu, Leonard C Feldman, N. H. Tolk, Zhenyu Zhang, P. I. Cohen

Research output: Contribution to journalArticle

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Abstract

Past efforts to achieve selective bond scission by vibrational excitation have been thwarted by energy thermalization. Here we report resonant photodesorption of hydrogen from a Si(111) surface using tunable infrared radiation. The wavelength dependence of the desorption yield peaks at 0.26 electron volt: the energy of the Si-H vibrational stretch mode. The desorption yield is quadratic in the infrared intensity. A strong H/D isotope effect rules out thermal desorption mechanisms, and electronic effects are not applicable in this low-energy regime. A molecular mechanism accounting for the desorption event remains elusive.

Original languageEnglish
Pages (from-to)1024-1026
Number of pages3
JournalScience
Volume312
Issue number5776
DOIs
Publication statusPublished - May 19 2006

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Isotopes
Hydrogen
Hot Temperature
Electrons
Radiation

ASJC Scopus subject areas

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Desorption of H from Si(111) by resonant excitation of the Si-H vibrational stretch mode. / Liu, Zhiheng; Feldman, Leonard C; Tolk, N. H.; Zhang, Zhenyu; Cohen, P. I.

In: Science, Vol. 312, No. 5776, 19.05.2006, p. 1024-1026.

Research output: Contribution to journalArticle

Liu, Zhiheng ; Feldman, Leonard C ; Tolk, N. H. ; Zhang, Zhenyu ; Cohen, P. I. / Desorption of H from Si(111) by resonant excitation of the Si-H vibrational stretch mode. In: Science. 2006 ; Vol. 312, No. 5776. pp. 1024-1026.
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