Development of highly selective oxidation catalysts by atomic layer deposition

Jeffrey W. Elam, Michael J. Pellin, Larry A. Curtiss, Hau H. Wang, Gregory K. Krumdick, Joseph A. Libera, Gerry W. Zajac, Steven A. Cohen, Peter C. Stair

Research output: Contribution to conferencePaper

Abstract

New techniques for the manufacture of catalysts by atomic layer deposition (ALD) for the selective oxidative dehydrogenation of alkanes were presented. The catalyst manufacturing techniques were described by developing, characterizing, testing, and evaluating new catalysts for the direct ammoxidation of propane to acrylonitrile on existing catalytic substrates in conventional reactors and in single-pass catalytic reactors utilizing catalytic membranes. The preparation of the ALD catalysts comprised of the oxides of vanadium, niobium, and other transition metals was analyzed. The ALD oxide materials were applied onto high surface area silica gel powders as well as anodic aluminum oxide membranes. This is an abstract of a paper presented at the AIChE Spring National Meeting (Houston, TX 4/22-27/2007).

Original languageEnglish
Publication statusPublished - Dec 1 2007
Event2007 AIChE Spring National Meeting - Houston, TX, United States
Duration: Apr 22 2007Apr 27 2007

Other

Other2007 AIChE Spring National Meeting
CountryUnited States
CityHouston, TX
Period4/22/074/27/07

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ASJC Scopus subject areas

  • Biotechnology
  • Chemical Engineering(all)
  • Bioengineering
  • Safety, Risk, Reliability and Quality

Cite this

Elam, J. W., Pellin, M. J., Curtiss, L. A., Wang, H. H., Krumdick, G. K., Libera, J. A., Zajac, G. W., Cohen, S. A., & Stair, P. C. (2007). Development of highly selective oxidation catalysts by atomic layer deposition. Paper presented at 2007 AIChE Spring National Meeting, Houston, TX, United States.