Directed growth of electroactive metal-organic framework thin films using electrophoretic deposition

Idan Hod, Wojciech Bury, David M. Karlin, Pravas Deria, Chung Wei Kung, Michael J. Katz, Monica So, Benjamin Klahr, Danni Jin, Yip Wah Chung, Teri W. Odom, Omar K. Farha, Joseph T. Hupp

Research output: Contribution to journalArticle

148 Citations (Scopus)

Abstract

Electrophoretic deposition (EPD) is used to assemble metal-organic framework (MOF) materials in nano- and micro-particulate, thin-fi lm form. The fl exibility of the method is demonstrated by the successful deposition of 4 types of MOFs: NU-1000, UiO-66, HKUST-1, and Al- MIL-53. Additionally, EPD is used to pattern the growth of NU-1000 thin fi lms that exhibit full electrochemical activity.

Original languageEnglish
Pages (from-to)6295-6300
Number of pages6
JournalAdvanced Materials
Volume26
Issue number36
DOIs
Publication statusPublished - Sep 1 2014

ASJC Scopus subject areas

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

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    Hod, I., Bury, W., Karlin, D. M., Deria, P., Kung, C. W., Katz, M. J., So, M., Klahr, B., Jin, D., Chung, Y. W., Odom, T. W., Farha, O. K., & Hupp, J. T. (2014). Directed growth of electroactive metal-organic framework thin films using electrophoretic deposition. Advanced Materials, 26(36), 6295-6300. https://doi.org/10.1002/adma.201401940