Does hydrogen change the fullerenelike structure in C Nx thin films?

Debdulal Roy, Manish Chhowalla, Niklas Hellgren, G. A J Amaratunga

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

The authors have reported the structure of the nanoclusters in carbon nitride thin films before [D. Roy, Phys. Rev. B 70, 035406 (2004)]. In this work, effects of the addition of hydrogen in the deposition gas mixture on the structures of carbon nitride thin films prepared by magnetron sputtering were investigated using Raman spectroscopy. Raman measurements showed that the structures of carbon nanoclusters remained unaffected by the addition of hydrogen in the carbon nitride films. On the other hand, the structures of amorphous thin films were affected by the addition of hydrogen in the deposition gas mixture. These are explained in terms of changes in the ratios of the D -peak to the G -peak intensities and shifts in the G -peak centers.

Original languageEnglish
Pages (from-to)1227-1230
Number of pages4
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume27
Issue number5
DOIs
Publication statusPublished - 2009

Fingerprint

carbon nitrides
Carbon nitride
Hydrogen
Nanoclusters
nanoclusters
Gas mixtures
Thin films
gas mixtures
hydrogen
thin films
Amorphous films
Magnetron sputtering
Raman spectroscopy
magnetron sputtering
Carbon
carbon
shift
cyanogen

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

Cite this

Does hydrogen change the fullerenelike structure in C Nx thin films? / Roy, Debdulal; Chhowalla, Manish; Hellgren, Niklas; Amaratunga, G. A J.

In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 27, No. 5, 2009, p. 1227-1230.

Research output: Contribution to journalArticle

@article{10b316313df043aca7ad4037a2f4b592,
title = "Does hydrogen change the fullerenelike structure in C Nx thin films?",
abstract = "The authors have reported the structure of the nanoclusters in carbon nitride thin films before [D. Roy, Phys. Rev. B 70, 035406 (2004)]. In this work, effects of the addition of hydrogen in the deposition gas mixture on the structures of carbon nitride thin films prepared by magnetron sputtering were investigated using Raman spectroscopy. Raman measurements showed that the structures of carbon nanoclusters remained unaffected by the addition of hydrogen in the carbon nitride films. On the other hand, the structures of amorphous thin films were affected by the addition of hydrogen in the deposition gas mixture. These are explained in terms of changes in the ratios of the D -peak to the G -peak intensities and shifts in the G -peak centers.",
author = "Debdulal Roy and Manish Chhowalla and Niklas Hellgren and Amaratunga, {G. A J}",
year = "2009",
doi = "10.1116/1.3207949",
language = "English",
volume = "27",
pages = "1227--1230",
journal = "Journal of Vacuum Science and Technology A",
issn = "0734-2101",
publisher = "AVS Science and Technology Society",
number = "5",

}

TY - JOUR

T1 - Does hydrogen change the fullerenelike structure in C Nx thin films?

AU - Roy, Debdulal

AU - Chhowalla, Manish

AU - Hellgren, Niklas

AU - Amaratunga, G. A J

PY - 2009

Y1 - 2009

N2 - The authors have reported the structure of the nanoclusters in carbon nitride thin films before [D. Roy, Phys. Rev. B 70, 035406 (2004)]. In this work, effects of the addition of hydrogen in the deposition gas mixture on the structures of carbon nitride thin films prepared by magnetron sputtering were investigated using Raman spectroscopy. Raman measurements showed that the structures of carbon nanoclusters remained unaffected by the addition of hydrogen in the carbon nitride films. On the other hand, the structures of amorphous thin films were affected by the addition of hydrogen in the deposition gas mixture. These are explained in terms of changes in the ratios of the D -peak to the G -peak intensities and shifts in the G -peak centers.

AB - The authors have reported the structure of the nanoclusters in carbon nitride thin films before [D. Roy, Phys. Rev. B 70, 035406 (2004)]. In this work, effects of the addition of hydrogen in the deposition gas mixture on the structures of carbon nitride thin films prepared by magnetron sputtering were investigated using Raman spectroscopy. Raman measurements showed that the structures of carbon nanoclusters remained unaffected by the addition of hydrogen in the carbon nitride films. On the other hand, the structures of amorphous thin films were affected by the addition of hydrogen in the deposition gas mixture. These are explained in terms of changes in the ratios of the D -peak to the G -peak intensities and shifts in the G -peak centers.

UR - http://www.scopus.com/inward/record.url?scp=70349090479&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=70349090479&partnerID=8YFLogxK

U2 - 10.1116/1.3207949

DO - 10.1116/1.3207949

M3 - Article

VL - 27

SP - 1227

EP - 1230

JO - Journal of Vacuum Science and Technology A

JF - Journal of Vacuum Science and Technology A

SN - 0734-2101

IS - 5

ER -