Effect of atomic layer deposition coatings on the surface structure of anodic aluminum oxide membranes

Guang Xiong, Jeffrey W. Elam, Hao Feng, Catherine Y. Han, Hsien Hau Wang, Lennox E. Iton, Larry A. Curtiss, Michael J. Pellin, Mayfair Kung, Harold H Kung, Peter C Stair

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Abstract

Anodic aluminum oxide (AAO) membranes were characterized by UV Raman and FT-IR spectroscopies before and after coating the entire surface (including the interior pore walls) of the AAO membranes by atomic layer deposition (ALD). UV Raman reveals the presence of aluminum oxalate in bulk AAO, both before and after ALD coating with A1 2O 3, because of acid anion incorporation during the anodization process used to produce AAO membranes. The aluminum oxalate in AAO exhibits remarkable thermal stability, not totally decomposing in air until exposed to a temperature >900 °C. ALD was used to cover the surface of AAO with either Al 2O 3 or TiO 2. Uncoated AAO have FT-IR spectra with two separate types of OH stretches that can be assigned to isolated OH groups and hydrogen-bonded surface OH groups, respectively. In contrast, AAO surfaces coated by ALD with Al 2O 3 display a single, broad band of hydrogen-bonded OH groups. AAO substrates coated with TiO 2 show a more complicated behavior. UV Raman results show that very thin TiO 2 coatings (1 nm) are not stable upon annealing to 500 °C. In contrast, thicker coatings can totally cover the contaminated alumina surface and are stable at temperatures in excess of 500 °C.

Original languageEnglish
Pages (from-to)14059-14063
Number of pages5
JournalJournal of Physical Chemistry B
Volume109
Issue number29
DOIs
Publication statusPublished - Jul 28 2005

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Atomic layer deposition
Aluminum Oxide
atomic layer epitaxy
Surface structure
aluminum oxides
membranes
Membranes
Aluminum
coatings
Coatings
Oxides
Oxalic Acid
oxalates
Hydrogen
aluminum
hydrogen
Anions
coating
Infrared spectroscopy
Thermodynamic stability

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry

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Effect of atomic layer deposition coatings on the surface structure of anodic aluminum oxide membranes. / Xiong, Guang; Elam, Jeffrey W.; Feng, Hao; Han, Catherine Y.; Wang, Hsien Hau; Iton, Lennox E.; Curtiss, Larry A.; Pellin, Michael J.; Kung, Mayfair; Kung, Harold H; Stair, Peter C.

In: Journal of Physical Chemistry B, Vol. 109, No. 29, 28.07.2005, p. 14059-14063.

Research output: Contribution to journalArticle

Xiong, G, Elam, JW, Feng, H, Han, CY, Wang, HH, Iton, LE, Curtiss, LA, Pellin, MJ, Kung, M, Kung, HH & Stair, PC 2005, 'Effect of atomic layer deposition coatings on the surface structure of anodic aluminum oxide membranes', Journal of Physical Chemistry B, vol. 109, no. 29, pp. 14059-14063. https://doi.org/10.1021/jp0503415
Xiong, Guang ; Elam, Jeffrey W. ; Feng, Hao ; Han, Catherine Y. ; Wang, Hsien Hau ; Iton, Lennox E. ; Curtiss, Larry A. ; Pellin, Michael J. ; Kung, Mayfair ; Kung, Harold H ; Stair, Peter C. / Effect of atomic layer deposition coatings on the surface structure of anodic aluminum oxide membranes. In: Journal of Physical Chemistry B. 2005 ; Vol. 109, No. 29. pp. 14059-14063.
@article{b6ee48244c5b4e6d9777cd1e091709f6,
title = "Effect of atomic layer deposition coatings on the surface structure of anodic aluminum oxide membranes",
abstract = "Anodic aluminum oxide (AAO) membranes were characterized by UV Raman and FT-IR spectroscopies before and after coating the entire surface (including the interior pore walls) of the AAO membranes by atomic layer deposition (ALD). UV Raman reveals the presence of aluminum oxalate in bulk AAO, both before and after ALD coating with A1 2O 3, because of acid anion incorporation during the anodization process used to produce AAO membranes. The aluminum oxalate in AAO exhibits remarkable thermal stability, not totally decomposing in air until exposed to a temperature >900 °C. ALD was used to cover the surface of AAO with either Al 2O 3 or TiO 2. Uncoated AAO have FT-IR spectra with two separate types of OH stretches that can be assigned to isolated OH groups and hydrogen-bonded surface OH groups, respectively. In contrast, AAO surfaces coated by ALD with Al 2O 3 display a single, broad band of hydrogen-bonded OH groups. AAO substrates coated with TiO 2 show a more complicated behavior. UV Raman results show that very thin TiO 2 coatings (1 nm) are not stable upon annealing to 500 °C. In contrast, thicker coatings can totally cover the contaminated alumina surface and are stable at temperatures in excess of 500 °C.",
author = "Guang Xiong and Elam, {Jeffrey W.} and Hao Feng and Han, {Catherine Y.} and Wang, {Hsien Hau} and Iton, {Lennox E.} and Curtiss, {Larry A.} and Pellin, {Michael J.} and Mayfair Kung and Kung, {Harold H} and Stair, {Peter C}",
year = "2005",
month = "7",
day = "28",
doi = "10.1021/jp0503415",
language = "English",
volume = "109",
pages = "14059--14063",
journal = "Journal of Physical Chemistry B Materials",
issn = "1520-6106",
publisher = "American Chemical Society",
number = "29",

}

TY - JOUR

T1 - Effect of atomic layer deposition coatings on the surface structure of anodic aluminum oxide membranes

AU - Xiong, Guang

AU - Elam, Jeffrey W.

AU - Feng, Hao

AU - Han, Catherine Y.

AU - Wang, Hsien Hau

AU - Iton, Lennox E.

AU - Curtiss, Larry A.

AU - Pellin, Michael J.

AU - Kung, Mayfair

AU - Kung, Harold H

AU - Stair, Peter C

PY - 2005/7/28

Y1 - 2005/7/28

N2 - Anodic aluminum oxide (AAO) membranes were characterized by UV Raman and FT-IR spectroscopies before and after coating the entire surface (including the interior pore walls) of the AAO membranes by atomic layer deposition (ALD). UV Raman reveals the presence of aluminum oxalate in bulk AAO, both before and after ALD coating with A1 2O 3, because of acid anion incorporation during the anodization process used to produce AAO membranes. The aluminum oxalate in AAO exhibits remarkable thermal stability, not totally decomposing in air until exposed to a temperature >900 °C. ALD was used to cover the surface of AAO with either Al 2O 3 or TiO 2. Uncoated AAO have FT-IR spectra with two separate types of OH stretches that can be assigned to isolated OH groups and hydrogen-bonded surface OH groups, respectively. In contrast, AAO surfaces coated by ALD with Al 2O 3 display a single, broad band of hydrogen-bonded OH groups. AAO substrates coated with TiO 2 show a more complicated behavior. UV Raman results show that very thin TiO 2 coatings (1 nm) are not stable upon annealing to 500 °C. In contrast, thicker coatings can totally cover the contaminated alumina surface and are stable at temperatures in excess of 500 °C.

AB - Anodic aluminum oxide (AAO) membranes were characterized by UV Raman and FT-IR spectroscopies before and after coating the entire surface (including the interior pore walls) of the AAO membranes by atomic layer deposition (ALD). UV Raman reveals the presence of aluminum oxalate in bulk AAO, both before and after ALD coating with A1 2O 3, because of acid anion incorporation during the anodization process used to produce AAO membranes. The aluminum oxalate in AAO exhibits remarkable thermal stability, not totally decomposing in air until exposed to a temperature >900 °C. ALD was used to cover the surface of AAO with either Al 2O 3 or TiO 2. Uncoated AAO have FT-IR spectra with two separate types of OH stretches that can be assigned to isolated OH groups and hydrogen-bonded surface OH groups, respectively. In contrast, AAO surfaces coated by ALD with Al 2O 3 display a single, broad band of hydrogen-bonded OH groups. AAO substrates coated with TiO 2 show a more complicated behavior. UV Raman results show that very thin TiO 2 coatings (1 nm) are not stable upon annealing to 500 °C. In contrast, thicker coatings can totally cover the contaminated alumina surface and are stable at temperatures in excess of 500 °C.

UR - http://www.scopus.com/inward/record.url?scp=23844549854&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=23844549854&partnerID=8YFLogxK

U2 - 10.1021/jp0503415

DO - 10.1021/jp0503415

M3 - Article

C2 - 16852765

AN - SCOPUS:23844549854

VL - 109

SP - 14059

EP - 14063

JO - Journal of Physical Chemistry B Materials

JF - Journal of Physical Chemistry B Materials

SN - 1520-6106

IS - 29

ER -