Effects of Deposition Rate And Substrate Temperature On The Orientation And The Growth of Yba2Cu3OxThin Films

J. Q. Zheng, X. K. Wang, M. Shih, S. W. Williams, S. J. Lee, P. Dutta, Robert P. H. Chang, J. B. Ketterson

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

We report what we be1ieve to be the first real time, in-Situ studies of film growth by sputtering using synchrotron X-rays; the structure and growth habit of YBa2Cu3Ox (YBCO) thin films deposited on (100) SrTiO3in a miniature, faced-magnetron sputtering system have been investigated. A combination of the substrate temperature and the deposition rate determines whether the film grows along the a, c or multiple axes. At low substrate temperatures and low deposition rates, the films grow preferentially along the a-axis. In contrast, higher substrate temperatures and high deposition rates favor c-axis oriented film growth with some admixture of (220). The X-ray diffraction peaks were monitored in real time revealing that both a-axis and c-axis oriented grains nucleated on the surface of the (100) SrTiO3between 6250 and 7650C, although the volume fraction of each orientation was temperature dependent. The structural quality of the a-axis films is superior to that of the c-axis films. The best a-axis films (deposited at 6850C), had a rocking curve width of 0.080, which is 10 times smaller than that for the c-axis films (deposited at 8000C). We have observed a shift of the (007) and (200) peak positions during deposition. The shift in the (007) peak is larger than that for the (200) peak. Defects in the c-axis films were observed, not only at the interface between the film and the substrate, but also on the upper surface of the (final) film; the latter seems to be inherent and is more severe in our films.

Original languageEnglish
Pages (from-to)1025-1028
Number of pages4
JournalIEEE Transactions on Magnetics
Volume27
Issue number2
DOIs
Publication statusPublished - 1991

Fingerprint

Deposition rates
Substrates
Temperature
temperature
Film growth
Synchrotrons
shift
Magnetron sputtering
habits
Sputtering
admixtures
Volume fraction
magnetron sputtering
synchrotrons
x rays
X ray diffraction
X rays
Thin films
sputtering
Defects

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Physics and Astronomy (miscellaneous)

Cite this

Zheng, J. Q., Wang, X. K., Shih, M., Williams, S. W., Lee, S. J., Dutta, P., ... Ketterson, J. B. (1991). Effects of Deposition Rate And Substrate Temperature On The Orientation And The Growth of Yba2Cu3OxThin Films. IEEE Transactions on Magnetics, 27(2), 1025-1028. https://doi.org/10.1109/20.133351

Effects of Deposition Rate And Substrate Temperature On The Orientation And The Growth of Yba2Cu3OxThin Films. / Zheng, J. Q.; Wang, X. K.; Shih, M.; Williams, S. W.; Lee, S. J.; Dutta, P.; Chang, Robert P. H.; Ketterson, J. B.

In: IEEE Transactions on Magnetics, Vol. 27, No. 2, 1991, p. 1025-1028.

Research output: Contribution to journalArticle

Zheng, J. Q. ; Wang, X. K. ; Shih, M. ; Williams, S. W. ; Lee, S. J. ; Dutta, P. ; Chang, Robert P. H. ; Ketterson, J. B. / Effects of Deposition Rate And Substrate Temperature On The Orientation And The Growth of Yba2Cu3OxThin Films. In: IEEE Transactions on Magnetics. 1991 ; Vol. 27, No. 2. pp. 1025-1028.
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