EFFECTS OF ION TRANSPORT ON PLASMA OXIDATION OF SILICON.

Robert P. H. Chang, J. Siejka, J. Perriere, M. Croset

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Original language	English
Title of host publication	Proceedings - The Electrochemical Society
Publisher	Electrochem Soc Inc
Pages	38-44
Number of pages	7
Volume	82-6
Publication status	Published - 1982

Cite this

Chang, R. P. H., Siejka, J., Perriere, J., & Croset, M. (1982). EFFECTS OF ION TRANSPORT ON PLASMA OXIDATION OF SILICON. In Proceedings - The Electrochemical Society (Vol. 82-6, pp. 38-44). Electrochem Soc Inc.

@inproceedings{326ed46799f54b038c94ef0413f24aac,

title = "EFFECTS OF ION TRANSPORT ON PLASMA OXIDATION OF SILICON.",

author = "Chang, {Robert P. H.} and J. Siejka and J. Perriere and M. Croset",

year = "1982",

language = "English",

volume = "82-6",

pages = "38--44",

booktitle = "Proceedings - The Electrochemical Society",

publisher = "Electrochem Soc Inc",

}

TY - GEN

T1 - EFFECTS OF ION TRANSPORT ON PLASMA OXIDATION OF SILICON.

AU - Chang, Robert P. H.

AU - Siejka, J.

AU - Perriere, J.

AU - Croset, M.

PY - 1982

Y1 - 1982

UR - http://www.scopus.com/inward/record.url?scp=0020295808&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0020295808&partnerID=8YFLogxK

M3 - Conference contribution

AN - SCOPUS:0020295808

VL - 82-6

SP - 38

EP - 44

BT - Proceedings - The Electrochemical Society

PB - Electrochem Soc Inc

ER -