| Original language | English |
|---|---|
| Title of host publication | Proceedings - The Electrochemical Society |
| Publisher | Electrochem Soc Inc |
| Pages | 38-44 |
| Number of pages | 7 |
| Volume | 82-6 |
| Publication status | Published - 1982 |
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Plasmas
Silicon
Oxidation
Ions
ASJC Scopus subject areas
- Engineering(all)
Cite this
Chang, R. P. H., Siejka, J., Perriere, J., & Croset, M. (1982). EFFECTS OF ION TRANSPORT ON PLASMA OXIDATION OF SILICON. In Proceedings - The Electrochemical Society (Vol. 82-6, pp. 38-44). Electrochem Soc Inc.
EFFECTS OF ION TRANSPORT ON PLASMA OXIDATION OF SILICON. / Chang, Robert P. H.; Siejka, J.; Perriere, J.; Croset, M.
Proceedings - The Electrochemical Society. Vol. 82-6 Electrochem Soc Inc, 1982. p. 38-44.Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
Chang, RPH, Siejka, J, Perriere, J & Croset, M 1982, EFFECTS OF ION TRANSPORT ON PLASMA OXIDATION OF SILICON. in Proceedings - The Electrochemical Society. vol. 82-6, Electrochem Soc Inc, pp. 38-44.
Chang RPH, Siejka J, Perriere J, Croset M. EFFECTS OF ION TRANSPORT ON PLASMA OXIDATION OF SILICON. In Proceedings - The Electrochemical Society. Vol. 82-6. Electrochem Soc Inc. 1982. p. 38-44
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title = "EFFECTS OF ION TRANSPORT ON PLASMA OXIDATION OF SILICON.",
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