Efficient route to TIBa 2Ca 2Cu 3O 9+x thin films by metal-organic chemical vapor deposition using TIF as a thallination source

R. J. McNeely, J. A. Belot, B. J. Hinds, Tobin J Marks, J. L. Schindler, M. P. Chudzik, C. R. Kannewurf, X. F. Zhang, D. J. Miller

Research output: Contribution to journalArticle

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Abstract

Thin TlBa 2Ca 2Cu 3O 9+x. films were grown on single crystal (110) LaAlO 3 from metal-organic chemical-vapor deposition-derived Ba-Ca-Cu-O x precursor films employing Ba(hfa)2·mep, Ca(hfa) 2·tet, and Cu(dpm) 2 (hfa=hexafluoroacetylacetonate; dpm=dipivaloylmethanate; tet=tetraglyme; mep=methylethylpentaglyme) as the volatile metal sources. Thallination is then accomplished by annealing the precursor films in the presence of a bulk BaO+CaO+CuO+TlF source at 885°C in flowing O 2. The presence of TlF is essential for nucleating the Tl-1223 phase. The resulting Tl-1223 films are nearly phase-pure, highly oriented, epitaxial by x-ray diffraction, and contain negligible fluoride by windowless energy-dispersive x-ray measurements. The films exhibit a transport measured T c = 103 K and J c = 4.4 × 10 4 A/cm 2 (77 K, 0 T). Magnetic hysteresis measurements yield J c = 1.9 × 10 5 A/cm 2 (30 K, 0.01 T) and show considerable flux pinning at low temperatures with J c = 1.4 × 10 5 A/cm 2 (5 K, 4.5 T).

Original languageEnglish
Pages (from-to)1243-1245
Number of pages3
JournalApplied Physics Letters
Volume71
Issue number9
Publication statusPublished - Sep 1 1997

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metalorganic chemical vapor deposition
routes
thin films
flux pinning
fluorides
x ray diffraction
hysteresis
annealing
single crystals
metals
x rays
energy

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

McNeely, R. J., Belot, J. A., Hinds, B. J., Marks, T. J., Schindler, J. L., Chudzik, M. P., ... Miller, D. J. (1997). Efficient route to TIBa 2Ca 2Cu 3O 9+x thin films by metal-organic chemical vapor deposition using TIF as a thallination source. Applied Physics Letters, 71(9), 1243-1245.

Efficient route to TIBa 2Ca 2Cu 3O 9+x thin films by metal-organic chemical vapor deposition using TIF as a thallination source. / McNeely, R. J.; Belot, J. A.; Hinds, B. J.; Marks, Tobin J; Schindler, J. L.; Chudzik, M. P.; Kannewurf, C. R.; Zhang, X. F.; Miller, D. J.

In: Applied Physics Letters, Vol. 71, No. 9, 01.09.1997, p. 1243-1245.

Research output: Contribution to journalArticle

McNeely, RJ, Belot, JA, Hinds, BJ, Marks, TJ, Schindler, JL, Chudzik, MP, Kannewurf, CR, Zhang, XF & Miller, DJ 1997, 'Efficient route to TIBa 2Ca 2Cu 3O 9+x thin films by metal-organic chemical vapor deposition using TIF as a thallination source', Applied Physics Letters, vol. 71, no. 9, pp. 1243-1245.
McNeely, R. J. ; Belot, J. A. ; Hinds, B. J. ; Marks, Tobin J ; Schindler, J. L. ; Chudzik, M. P. ; Kannewurf, C. R. ; Zhang, X. F. ; Miller, D. J. / Efficient route to TIBa 2Ca 2Cu 3O 9+x thin films by metal-organic chemical vapor deposition using TIF as a thallination source. In: Applied Physics Letters. 1997 ; Vol. 71, No. 9. pp. 1243-1245.
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AU - Hinds, B. J.

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