Efficient route to TIBa2Ca2Cu3O9+x thin films by metal-organic chemical vapor deposition using TIF as a thallination source

R. J. McNeely, J. A. Belot, B. J. Hinds, T. J. Marks, J. L. Schindler, M. P. Chudzik, C. R. Kannewurf, X. F. Zhang, D. J. Miller

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

Thin TlBa2Ca2Cu3O9+x. films were grown on single crystal (110) LaAlO3 from metal-organic chemical-vapor deposition-derived Ba-Ca-Cu-Ox precursor films employing Ba(hfa)2·mep, Ca(hfa)2·tet, and Cu(dpm)2 (hfa=hexafluoroacetylacetonate; dpm=dipivaloylmethanate; tet=tetraglyme; mep=methylethylpentaglyme) as the volatile metal sources. Thallination is then accomplished by annealing the precursor films in the presence of a bulk BaO+CaO+CuO+TlF source at 885°C in flowing O2. The presence of TlF is essential for nucleating the Tl-1223 phase. The resulting Tl-1223 films are nearly phase-pure, highly oriented, epitaxial by x-ray diffraction, and contain negligible fluoride by windowless energy-dispersive x-ray measurements. The films exhibit a transport measured Tc = 103 K and Jc = 4.4 × 104 A/cm2 (77 K, 0 T). Magnetic hysteresis measurements yield Jc = 1.9 × 105 A/cm2 (30 K, 0.01 T) and show considerable flux pinning at low temperatures with Jc = 1.4 × 105 A/cm2 (5 K, 4.5 T).

Original languageEnglish
Pages (from-to)1243-1245
Number of pages3
JournalApplied Physics Letters
Volume71
Issue number9
DOIs
Publication statusPublished - Sep 1 1997

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Fingerprint Dive into the research topics of 'Efficient route to TIBa<sub>2</sub>Ca<sub>2</sub>Cu<sub>3</sub>O<sub>9+x</sub> thin films by metal-organic chemical vapor deposition using TIF as a thallination source'. Together they form a unique fingerprint.

Cite this