Elastic deformations in thin freestanding ferroelectric films

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

We investigated mechanical stress in thin freestanding BaTiO3 films prepared on bare silicon and on silicon, covered by a 120 nm thick, randomly oriented Al2O3 buffer. Films prepared on bare silicon by RF sputtering are essentially stress-free. However, they disintegrate after substrate removal. In contrast, the films prepared on the Al2O3 buffer have high tensile stress, but retain their structural integrity after separation from the substrate. Substrate removal is accompanied by film corrugation; at the same time, the freestanding films resonate mechanically. This seeming contradiction can be understood on the basis of a recently developed theory of 2D clamping in thin ferroelectric films.

Original languageEnglish
Pages (from-to)604-607
Number of pages4
JournalAdvanced Engineering Materials
Volume4
Issue number8
DOIs
Publication statusPublished - Aug 2002

Fingerprint

Ferroelectric thin films
elastic deformation
Elastic deformation
Silicon
Buffers
Substrates
silicon
buffers
Structural integrity
Tensile stress
Sputtering
tensile stress
integrity
sputtering

ASJC Scopus subject areas

  • Materials Science (miscellaneous)

Cite this

Elastic deformations in thin freestanding ferroelectric films. / Nair, J.; Lubomirsky, Igor.

In: Advanced Engineering Materials, Vol. 4, No. 8, 08.2002, p. 604-607.

Research output: Contribution to journalArticle

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