Electrical and band-gap properties of amorphous zinc-indium-tin oxide thin films

D. B. Buchholz, D. E. Proffit, M. D. Wisser, Thomas O Mason, Robert P. H. Chang

Research output: Contribution to journalArticle

19 Citations (Scopus)

Abstract

Zinc-indium-tin oxide (ZITO) films were grown by pulsed-laser deposition. Three different material compositions were investigated: ZITO-30, ZITO-50 and ZITO-70 in which 30%, 50% and 70%, respectively, of the indium in the In 2O 3 structure was replaced by substitution with zinc and tin in equal molar proportions (co-substitution): In 2_2xZn xSn xO 3, where x = 0.3, 0.5, 0.7. All ZITO films grown at room temperature were amorphous. The first evidence of crystallinity was observed at higher deposition-temperature as the degree of co-substitution was increased. A decrease in mobility and conductivity was also observed as the degree of co-substitution was increased. The highest mobility for ZITO-30 and ZITO-50 was observed at deposition temperatures just prior to crystallization. The effect of deposition temperature on carrier concentration was minor compared to the effect of oxygen partial pressure during deposition.

Original languageEnglish
Pages (from-to)1-6
Number of pages6
JournalProgress in Natural Science
Volume22
Issue number1
DOIs
Publication statusPublished - Feb 2012

Fingerprint

Tin oxides
Indium
Oxide films
Zinc
Energy gap
Thin films
Substitution reactions
Temperature
Tin
indium tin oxide
Pulsed laser deposition
Crystallization
Partial pressure
Carrier concentration
Oxygen
Chemical analysis

Keywords

  • Amorphous
  • Deposition temperature
  • Oxide
  • Semiconductor
  • Transparent conducting oxide

ASJC Scopus subject areas

  • General

Cite this

Electrical and band-gap properties of amorphous zinc-indium-tin oxide thin films. / Buchholz, D. B.; Proffit, D. E.; Wisser, M. D.; Mason, Thomas O; Chang, Robert P. H.

In: Progress in Natural Science, Vol. 22, No. 1, 02.2012, p. 1-6.

Research output: Contribution to journalArticle

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AU - Chang, Robert P. H.

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N2 - Zinc-indium-tin oxide (ZITO) films were grown by pulsed-laser deposition. Three different material compositions were investigated: ZITO-30, ZITO-50 and ZITO-70 in which 30%, 50% and 70%, respectively, of the indium in the In 2O 3 structure was replaced by substitution with zinc and tin in equal molar proportions (co-substitution): In 2_2xZn xSn xO 3, where x = 0.3, 0.5, 0.7. All ZITO films grown at room temperature were amorphous. The first evidence of crystallinity was observed at higher deposition-temperature as the degree of co-substitution was increased. A decrease in mobility and conductivity was also observed as the degree of co-substitution was increased. The highest mobility for ZITO-30 and ZITO-50 was observed at deposition temperatures just prior to crystallization. The effect of deposition temperature on carrier concentration was minor compared to the effect of oxygen partial pressure during deposition.

AB - Zinc-indium-tin oxide (ZITO) films were grown by pulsed-laser deposition. Three different material compositions were investigated: ZITO-30, ZITO-50 and ZITO-70 in which 30%, 50% and 70%, respectively, of the indium in the In 2O 3 structure was replaced by substitution with zinc and tin in equal molar proportions (co-substitution): In 2_2xZn xSn xO 3, where x = 0.3, 0.5, 0.7. All ZITO films grown at room temperature were amorphous. The first evidence of crystallinity was observed at higher deposition-temperature as the degree of co-substitution was increased. A decrease in mobility and conductivity was also observed as the degree of co-substitution was increased. The highest mobility for ZITO-30 and ZITO-50 was observed at deposition temperatures just prior to crystallization. The effect of deposition temperature on carrier concentration was minor compared to the effect of oxygen partial pressure during deposition.

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