Electrical and field emission investigation of individual carbon nanotubes from plasma enhanced chemical vapour deposition

W. I. Milne, K. B K Teo, Manish Chhowalla, G. A J Amaratunga, S. B. Lee, D. G. Hasko, H. Ahmed, O. Groening, P. Legagneux, L. Gangloff, J. P. Schnell, G. Pirio, D. Pribat, M. Castignolles, A. Loiseau, V. Semet, Vu Thien Binh

Research output: Contribution to journalArticle

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Abstract

Plasma enhanced chemical vapour deposition (PECVD) is a controlled technique for the production of vertically aligned multiwall carbon nanotubes for field emission applications. In this paper, we investigate the electrical properties of individual carbon nanotubes which is important for designing field emission devices. PECVD nanotubes exhibit a room temperature resistance of 1-10 kΩ/μm length (resistivity 10-6 to 10-5 Ω m) and have a maximum current carrying capability of 0.2-2 mA (current density 107-108 A/cm2). The field emission characteristics show that the field enhancement of the structures is strongly related to the geometry (height/radius) of the structures and maximum emission currents of ∼ 10 μA were obtained. The failure of nanotubes under field emission is also discussed.

Original languageEnglish
Pages (from-to)422-428
Number of pages7
JournalDiamond and Related Materials
Volume12
Issue number3-7
DOIs
Publication statusPublished - Mar 2003

Fingerprint

Carbon Nanotubes
Plasma enhanced chemical vapor deposition
Field emission
field emission
Carbon nanotubes
carbon nanotubes
vapor deposition
Nanotubes
nanotubes
Electric properties
Current density
electrical properties
current density
electrical resistivity
radii
Geometry
augmentation
room temperature
geometry
Temperature

Keywords

  • Electrical characterisation
  • Field emission
  • Nanotubes
  • Plasma chemical vapour deposition

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Materials Chemistry
  • Surfaces, Coatings and Films
  • Surfaces and Interfaces

Cite this

Electrical and field emission investigation of individual carbon nanotubes from plasma enhanced chemical vapour deposition. / Milne, W. I.; Teo, K. B K; Chhowalla, Manish; Amaratunga, G. A J; Lee, S. B.; Hasko, D. G.; Ahmed, H.; Groening, O.; Legagneux, P.; Gangloff, L.; Schnell, J. P.; Pirio, G.; Pribat, D.; Castignolles, M.; Loiseau, A.; Semet, V.; Thien Binh, Vu.

In: Diamond and Related Materials, Vol. 12, No. 3-7, 03.2003, p. 422-428.

Research output: Contribution to journalArticle

Milne, WI, Teo, KBK, Chhowalla, M, Amaratunga, GAJ, Lee, SB, Hasko, DG, Ahmed, H, Groening, O, Legagneux, P, Gangloff, L, Schnell, JP, Pirio, G, Pribat, D, Castignolles, M, Loiseau, A, Semet, V & Thien Binh, V 2003, 'Electrical and field emission investigation of individual carbon nanotubes from plasma enhanced chemical vapour deposition', Diamond and Related Materials, vol. 12, no. 3-7, pp. 422-428. https://doi.org/10.1016/S0925-9635(02)00292-3
Milne, W. I. ; Teo, K. B K ; Chhowalla, Manish ; Amaratunga, G. A J ; Lee, S. B. ; Hasko, D. G. ; Ahmed, H. ; Groening, O. ; Legagneux, P. ; Gangloff, L. ; Schnell, J. P. ; Pirio, G. ; Pribat, D. ; Castignolles, M. ; Loiseau, A. ; Semet, V. ; Thien Binh, Vu. / Electrical and field emission investigation of individual carbon nanotubes from plasma enhanced chemical vapour deposition. In: Diamond and Related Materials. 2003 ; Vol. 12, No. 3-7. pp. 422-428.
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