Electrochemical characteristics of a self-propagating molecular-based assembly

Leila Motiei, Michal Lahav, Antonino Gulino, Mark A. Iron, Milko van der Boom

Research output: Contribution to journalArticle

22 Citations (Scopus)

Abstract

The electrochemical properties of a metallosupramolecular network that undergoes reversible redox chemistry on indium-tin oxide (ITO)-coated glass substrates have been investigated. The redox-active osmium complexes are electrochemically accessible even for films with a thickness > 15 nm. The electrochemical data correlates well with our previously observed self-propagating growth process, for which the electron density for the assemblies remains constant during film growth. Electron-transfer rate constants obtained by potential step chronoamperometry experiments suggest an exceptionally low attenuation factor, β, of 0.013 ± 0.001 Å-1. However, the intrinsically porous nature of the assembly could be to a large extent or even entirely responsible for such a low value.

Original languageEnglish
Pages (from-to)14283-14286
Number of pages4
JournalJournal of Physical Chemistry B
Volume114
Issue number45
DOIs
Publication statusPublished - Dec 8 2010

Fingerprint

assembly
Osmium
Chronoamperometry
osmium
Film growth
Tin oxides
Electrochemical properties
indium oxides
Indium
assemblies
tin oxides
Carrier concentration
Rate constants
electron transfer
attenuation
chemistry
Glass
Electrons
glass
Substrates

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Materials Chemistry
  • Surfaces, Coatings and Films

Cite this

Electrochemical characteristics of a self-propagating molecular-based assembly. / Motiei, Leila; Lahav, Michal; Gulino, Antonino; Iron, Mark A.; van der Boom, Milko.

In: Journal of Physical Chemistry B, Vol. 114, No. 45, 08.12.2010, p. 14283-14286.

Research output: Contribution to journalArticle

Motiei, Leila ; Lahav, Michal ; Gulino, Antonino ; Iron, Mark A. ; van der Boom, Milko. / Electrochemical characteristics of a self-propagating molecular-based assembly. In: Journal of Physical Chemistry B. 2010 ; Vol. 114, No. 45. pp. 14283-14286.
@article{f88375cb79cf47c1ab3ffcd37b2c18ce,
title = "Electrochemical characteristics of a self-propagating molecular-based assembly",
abstract = "The electrochemical properties of a metallosupramolecular network that undergoes reversible redox chemistry on indium-tin oxide (ITO)-coated glass substrates have been investigated. The redox-active osmium complexes are electrochemically accessible even for films with a thickness > 15 nm. The electrochemical data correlates well with our previously observed self-propagating growth process, for which the electron density for the assemblies remains constant during film growth. Electron-transfer rate constants obtained by potential step chronoamperometry experiments suggest an exceptionally low attenuation factor, β, of 0.013 ± 0.001 {\AA}-1. However, the intrinsically porous nature of the assembly could be to a large extent or even entirely responsible for such a low value.",
author = "Leila Motiei and Michal Lahav and Antonino Gulino and Iron, {Mark A.} and {van der Boom}, Milko",
year = "2010",
month = "12",
day = "8",
doi = "10.1021/jp910898f",
language = "English",
volume = "114",
pages = "14283--14286",
journal = "Journal of Physical Chemistry B Materials",
issn = "1520-6106",
publisher = "American Chemical Society",
number = "45",

}

TY - JOUR

T1 - Electrochemical characteristics of a self-propagating molecular-based assembly

AU - Motiei, Leila

AU - Lahav, Michal

AU - Gulino, Antonino

AU - Iron, Mark A.

AU - van der Boom, Milko

PY - 2010/12/8

Y1 - 2010/12/8

N2 - The electrochemical properties of a metallosupramolecular network that undergoes reversible redox chemistry on indium-tin oxide (ITO)-coated glass substrates have been investigated. The redox-active osmium complexes are electrochemically accessible even for films with a thickness > 15 nm. The electrochemical data correlates well with our previously observed self-propagating growth process, for which the electron density for the assemblies remains constant during film growth. Electron-transfer rate constants obtained by potential step chronoamperometry experiments suggest an exceptionally low attenuation factor, β, of 0.013 ± 0.001 Å-1. However, the intrinsically porous nature of the assembly could be to a large extent or even entirely responsible for such a low value.

AB - The electrochemical properties of a metallosupramolecular network that undergoes reversible redox chemistry on indium-tin oxide (ITO)-coated glass substrates have been investigated. The redox-active osmium complexes are electrochemically accessible even for films with a thickness > 15 nm. The electrochemical data correlates well with our previously observed self-propagating growth process, for which the electron density for the assemblies remains constant during film growth. Electron-transfer rate constants obtained by potential step chronoamperometry experiments suggest an exceptionally low attenuation factor, β, of 0.013 ± 0.001 Å-1. However, the intrinsically porous nature of the assembly could be to a large extent or even entirely responsible for such a low value.

UR - http://www.scopus.com/inward/record.url?scp=77955835718&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=77955835718&partnerID=8YFLogxK

U2 - 10.1021/jp910898f

DO - 10.1021/jp910898f

M3 - Article

C2 - 20088551

AN - SCOPUS:77955835718

VL - 114

SP - 14283

EP - 14286

JO - Journal of Physical Chemistry B Materials

JF - Journal of Physical Chemistry B Materials

SN - 1520-6106

IS - 45

ER -