Electron-beam-induced patterned deposition of allylcyclopentadienyl palladium using scanning tunneling microscopy

D. S. Saulys, A. Ermakov, Eric Garfunkel, P. A. Dowben

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Scanning tunneling microscopy has been used to study the electron-induced decomposition of allylcyclopentadienyl palladium [Pd(η3-C 3H5)(η5-C5H5)] and subsequent deposition on a Si(111) surface. Deposition occurs via an electron impact mechanism on either the tip or surface, depending on the bias polarity, and is observed with voltages of ≥2.75 V. This is close to the predicted condensed phase dissociation energy of 2.3 eV for Pd(η3-C 3H5)(η5-C5H5) →Pd+C3H5+C5H5. Metallic deposits of nanometer dimensions can be written on the surface. Deposition onto an electrochemically etched tip results in a narrow conductive secondary tip which gives improved spatial resolution when imaging high-aspect ratio features on the surface.

Original languageEnglish
Pages (from-to)7639-7641
Number of pages3
JournalJournal of Applied Physics
Issue number11
Publication statusPublished - 1994


ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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