Fabrication and electrical characteristics of carbon nanotube-based microcathodes for use in a parallel electron-beam lithography system

K. B K Teo, Manish Chhowalla, G. A J Amaratunga, W. I. Milne, P. Legagneux, G. Pirio, L. Gangloff, D. Pribat, V. Semet, Vu Thien Binh, W. H. Bruenger, J. Eichholz, H. Hanssen, D. Friedrich, S. B. Lee, D. G. Hasko, H. Ahmed

Research output: Contribution to journal › Article

89 Citations (Scopus)

Abstract

The development of the Nanolith parallel electron-beam writing head was discussed. The fabrication and electrical characteristics of carbon nanotube-based microcathodes for use in the lithographic system were described. The microcathode exhibited a peak current of 10.5 μA at 48 V when operated with a duty cycle of 0.5 percent.

Original languageEnglish
Pages (from-to)693-697
Number of pages5
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume21
Issue number2
Publication statusPublished - Mar 2003

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Electron beam lithography
Electron beams
Carbon nanotubes
lithography
carbon nanotubes
electron beams
Fabrication
cycles
fabrication

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Physics and Astronomy (miscellaneous)
  • Surfaces and Interfaces

Cite this

Fabrication and electrical characteristics of carbon nanotube-based microcathodes for use in a parallel electron-beam lithography system. / Teo, K. B K; Chhowalla, Manish; Amaratunga, G. A J; Milne, W. I.; Legagneux, P.; Pirio, G.; Gangloff, L.; Pribat, D.; Semet, V.; Binh, Vu Thien; Bruenger, W. H.; Eichholz, J.; Hanssen, H.; Friedrich, D.; Lee, S. B.; Hasko, D. G.; Ahmed, H.

In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Vol. 21, No. 2, 03.2003, p. 693-697.

Research output: Contribution to journal › Article

Teo, KBK, Chhowalla, M, Amaratunga, GAJ, Milne, WI, Legagneux, P, Pirio, G, Gangloff, L, Pribat, D, Semet, V, Binh, VT, Bruenger, WH, Eichholz, J, Hanssen, H, Friedrich, D, Lee, SB, Hasko, DG & Ahmed, H 2003, 'Fabrication and electrical characteristics of carbon nanotube-based microcathodes for use in a parallel electron-beam lithography system', Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, vol. 21, no. 2, pp. 693-697.
Teo KBK, Chhowalla M, Amaratunga GAJ, Milne WI, Legagneux P, Pirio G et al. Fabrication and electrical characteristics of carbon nanotube-based microcathodes for use in a parallel electron-beam lithography system. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 2003 Mar;21(2):693-697.
Teo, K. B K ; Chhowalla, Manish ; Amaratunga, G. A J ; Milne, W. I. ; Legagneux, P. ; Pirio, G. ; Gangloff, L. ; Pribat, D. ; Semet, V. ; Binh, Vu Thien ; Bruenger, W. H. ; Eichholz, J. ; Hanssen, H. ; Friedrich, D. ; Lee, S. B. ; Hasko, D. G. ; Ahmed, H. / Fabrication and electrical characteristics of carbon nanotube-based microcathodes for use in a parallel electron-beam lithography system. In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 2003 ; Vol. 21, No. 2. pp. 693-697.
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