Fabrication of free-standing nanoscale alumina membranes with controllable pore aspect ratios

Chee Seng Toh, Brendan M. Kayes, E. Joseph Nemanick, Nathan S Lewis

Research output: Contribution to journalArticle

53 Citations (Scopus)

Abstract

Porous alumina films with controllable pore sizes and having submicrometer film thicknesses were fabricated by the anodization of Al overlayers. The Al was deposited by sputtering onto either glass or onto silicon that had been coated with a layer of silicon nitride. Alumina membranes having thicknesses between 300 and 1000 nm were prepared analogously using a lithographic process to produce free-standing porous alumina films that were peripherally supported on a 500-μm-thick silicon substrate.

Original languageEnglish
Pages (from-to)767-770
Number of pages4
JournalNano Letters
Volume4
Issue number5
DOIs
Publication statusPublished - May 2004

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Aluminum Oxide
aspect ratio
Aspect ratio
Alumina
aluminum oxides
Silicon
membranes
Membranes
porosity
Fabrication
fabrication
silicon
Silicon nitride
silicon nitrides
Pore size
Sputtering
Film thickness
film thickness
sputtering
Glass

ASJC Scopus subject areas

  • Materials Science(all)

Cite this

Fabrication of free-standing nanoscale alumina membranes with controllable pore aspect ratios. / Toh, Chee Seng; Kayes, Brendan M.; Nemanick, E. Joseph; Lewis, Nathan S.

In: Nano Letters, Vol. 4, No. 5, 05.2004, p. 767-770.

Research output: Contribution to journalArticle

Toh, Chee Seng ; Kayes, Brendan M. ; Nemanick, E. Joseph ; Lewis, Nathan S. / Fabrication of free-standing nanoscale alumina membranes with controllable pore aspect ratios. In: Nano Letters. 2004 ; Vol. 4, No. 5. pp. 767-770.
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